Inventor · disambiguated record
Jeong-Ju Park
Also filed as: PARK JEONG-JU
17 granted patents·7 pending applications·18 citations·filing 2003–2023
88Inventor score
Files withSAMSUNG ELECTRONICS CO LTD11PARK JEONG-JU6SAMSUNG DISPLAY CO LTD3KIM JOO-HAN1KIM KYOUNG-MI1
Top patents by PatentIndex Score
24 records- 0182US9437452B2Method of forming a fine pattern by using block copolymersSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Sep 6, 2016·4 cites·5 claims
- 0277US10032638B2Method of fabricating pattern structureSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jul 24, 2018·2 cites·12 claims
- 0377US9704722B2Method of forming fine pattern and method of manufacturing integrated circuit device using the methodPARK JEONG-JU·Filed 2015·Granted Jul 11, 2017·3 cites·20 claims
- 0466US10468250B2Rinse solution and method of fabricating integrated circuit device by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Nov 5, 2019·1 cites·16 claims
- 0565US10352964B2Cantilever set for atomic force microscopes, substrate surface inspection apparatus including the same, method of analyzing surface of semiconductor substrate by using the same, and method of forming micropattern by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jul 16, 2019·1 cites·14 claims
- 0661US2024324320A1Display device and method for fabricating the sameSAMSUNG DISPLAY CO LTD·Filed 2023·Application pending·0 cites
- 0760US10101660B2Methods of forming patterns of semiconductor devicesPARK JEONG JU·Filed 2016·Granted Oct 16, 2018·1 cites·15 claims
- 0855US6861690B2Lower electrode contact structure and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Mar 1, 2005·6 cites·14 claims
- 0953US10854465B2Method of fabricating pattern structureSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Dec 1, 2020·0 cites·20 claims
- 1049US9406807B2Crystallization method of thin film transistor, thin film transistor array panel and manufacturing method for thin film transistor array panelSAMSUNG DISPLAY CO LTD·Filed 2014·Granted Aug 2, 2016·0 cites·10 claims
- 1149US2008191355A1Semiconductor device having buffer layer pattern and method of forming sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1246US8741672B2Crystallization method of thin film transistor, thin film transistor array panel and manufacturing method for thin film transistor array panelKIM JOO-HAN·Filed 2012·Granted Jun 3, 2014·0 cites·16 claims
- 1345US9171864B2Display substrate and method of manufacturing the sameSAMSUNG DISPLAY CO LTD·Filed 2014·Granted Oct 27, 2015·0 cites·12 claims
- 1443US8685865B2Method of forming patterns of semiconductor devicePARK JEONG-JU·Filed 2012·Granted Apr 1, 2014·0 cites·20 claims
- 1541US7022569B2Lower electrode contact structure and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Apr 4, 2006·0 cites·4 claims
- 1641US2005273680A1Semiconductor device having buffer layer pattern and method of forming samePARK JEONG-JU·Filed 2005·Application pending·0 cites
- 1740US2007224758A1Semiconductor memory device and related fabrication methodPARK JEONG-JU·Filed 2006·Application pending·0 cites
- 1839US8551689B2Methods of manufacturing semiconductor devices using photolithographyPARK MI-RA·Filed 2011·Granted Oct 8, 2013·0 cites·23 claims
- 1937US9535326B2Methods of manufacturing a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jan 3, 2017·0 cites·20 claims
- 2037US2012064724A1Methods of Forming a Pattern of Semiconductor DevicesLEE BO-HEE·Filed 2011·Application pending·0 cites
- 2135US2011300712A1Methods of Forming a Photoresist Pattern Using Plasma Treatment of Photoresist PatternsKIM KYOUNG-MI·Filed 2011·Application pending·0 cites
- 2234US9892918B2Method of forming pattern of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Feb 13, 2018·0 cites·20 claims
- 2333US2012064463A1Method of Forming MicropatternsPARK JEONG-JU·Filed 2011·Application pending·0 cites
- 2432US10727078B2Methods of forming fine patternsSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jul 28, 2020·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →