Inventor · disambiguated record
Takanori Yamagishi
Also filed as: YAMAGISHI TAKANORI
18 granted patents·4 pending applications·105 citations·filing 1988–2011
92Inventor score
Files withMARUZEN PETROCHEM CO LTD12YAMAGISHI TAKANORI4IIJIMA MINORU3OIKAWA TOMO1TOKYO OHKA KOGYO CO LTD1
Top patents by PatentIndex Score
22 records- 0192US4927979AProcess for the preparation of p-ethylphenolMARUZEN PETROCHEM CO LTD·Filed 1988·Granted May 22, 1990·49 cites·20 claims
- 0289US7220808B2Thiol compound, copolymer and method for producing the copolymerMARUZEN PETROCHEM CO LTD·Filed 2004·Granted May 22, 2007·21 cites·5 claims
- 0380US7960494B2Copolymer for semiconductor lithography and process for producing the sameMARUZEN PETROCHEM CO LTD·Filed 2007·Granted Jun 14, 2011·5 cites·15 claims
- 0476US7695889B2Copolymer for semiconductor lithography and process for production thereofMARUZEN PETROCHEM CO LTD·Filed 2006·Granted Apr 13, 2010·4 cites·18 claims
- 0576US7342087B2Method for prevention of increase in particles in copolymer for semiconductor resistMARUZEN PETROCHEM CO LTD·Filed 2005·Granted Mar 11, 2008·4 cites·9 claims
- 0671US8067516B2Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithographyIIJIMA MINORU·Filed 2007·Granted Nov 29, 2011·3 cites·6 claims
- 0763US8119321B2Resist polymer solution and process for producing the sameYAMAGISHI TAKANORI·Filed 2004·Granted Feb 21, 2012·8 cites·12 claims
- 0862US7411097B2Thiol compound, copolymer and method for producing the copolymerMARUZEN PETROCHEM CO LTD·Filed 2007·Granted Aug 12, 2008·1 cites·2 claims
- 0959US8211615B2Copolymer for immersion lithography and compositionsYAMAGISHI TAKANORI·Filed 2007·Granted Jul 3, 2012·1 cites·8 claims
- 1056US7045582B2Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this processMARUZEN PETROCHEM CO LTD·Filed 2004·Granted May 16, 2006·3 cites·11 claims
- 1155US8163852B2Resist polymer and method for producing the polymerYAMAGISHI TAKANORI·Filed 2009·Granted Apr 24, 2012·0 cites·1 claims
- 1253US7838606B2Production process of copolymer for semiconductor lithographyMARUZEN PETROCHEM CO LTD·Filed 2004·Granted Nov 23, 2010·3 cites·13 claims
- 1351US8709698B2Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithographyIIJIMA MINORU·Filed 2011·Granted Apr 29, 2014·0 cites·1 claims
- 1448US8030419B2Process for producing polymer for semiconductor lithographyMARUZEN PETROCHEM CO LTD·Filed 2007·Granted Oct 4, 2011·0 cites·11 claims
- 1548US2005287474A1Resist polymer and method for producing the polymerYAMAGISHI TAKANORI·Filed 2005·Application pending·0 cites
- 1646US7910282B2Copolymer for semiconductor lithography and producing method thereof, and compositionMARUZEN PETROCHEM CO LTD·Filed 2005·Granted Mar 22, 2011·3 cites·8 claims
- 1745US8377625B2Method for producing a copolymer solution with a uniform concentration for semiconductor lithographyMARUZEN PETROCHEM CO LTD·Filed 2009·Granted Feb 19, 2013·0 cites·11 claims
- 1843US7972762B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jul 5, 2011·0 cites·10 claims
- 1942US2010324245A1Copolymer for semiconductor lithography and producing method thereof, and compositionMARUZEN PETROCHEM CO LTD·Filed 2010·Application pending·0 cites
- 2042US2004167298A1Resist polymer and method for producing the polymerFiled 2004·Application pending·0 cites
- 2139US2006287469A1Copolymer for semiconductor lithography, composition and thiol compoundIIJIMA MINORU·Filed 2006·Application pending·0 cites
- 2238US8859180B2Copolymer and composition for semiconductor lithography and process for producing the copolymerOIKAWA TOMO·Filed 2007·Granted Oct 14, 2014·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →