Inventor · disambiguated record
Hiroyuki Akagawa
Also filed as: AKAGAWA HIROYUKI
7 granted patents·24 citations·filing 2004–2011
81Inventor score
Technology areasG03F
Top patents by PatentIndex Score
7 records- 0189US7592104B2Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing methodHOYA CORP·Filed 2005·Granted Sep 22, 2009·10 cites·12 claims
- 0268US8318388B2Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing methodSUZUKI OSAMU·Filed 2011·Granted Nov 27, 2012·1 cites·13 claims
- 0368US7998644B2Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing methodHOYA CORP·Filed 2010·Granted Aug 16, 2011·1 cites·25 claims
- 0468US7892708B2Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing methodHOYA CORP·Filed 2010·Granted Feb 22, 2011·1 cites·35 claims
- 0565US7579120B2Substrate for reticle and method of manufacturing the substrate, and mask blank and method of manufacturing the mask blankHOYA CORP·Filed 2004·Granted Aug 25, 2009·9 cites·20 claims
- 0664US7745074B2Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing methodHOYA CORP·Filed 2009·Granted Jun 29, 2010·1 cites·15 claims
- 0762US7700244B2Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing methodHOYA CORP·Filed 2005·Granted Apr 20, 2010·1 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →