Inventor · disambiguated record
Masayoshi Sagehashi
Also filed as: SAGEHASHI MASAYOSHI
73 granted patents·12 pending applications·183 citations·filing 2009–2025
98Inventor score
Top patents by PatentIndex Score
85 records- 0198US10303056B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted May 28, 2019·11 cites·2 claims
- 0298US9250518B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Feb 2, 2016·35 cites·15 claims
- 0394US8703384B2Positive resist composition and patterning processKOBAYASHI TOMOHIRO·Filed 2011·Granted Apr 22, 2014·11 cites·6 claims
- 0493US9017922B2Chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Apr 28, 2015·8 cites·13 claims
- 0593US8921026B2Basic compound, chemically amplified resist composition, and patterning processHATAKEYAMA JUN·Filed 2011·Granted Dec 30, 2014·9 cites·9 claims
- 0693US8597869B2Sulfonium salt, resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2011·Granted Dec 3, 2013·10 cites·7 claims
- 0792US10126649B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 13, 2018·4 cites·20 claims
- 0891US10457779B2Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured filmSHINETSU CHEMICAL CO·Filed 2017·Granted Oct 29, 2019·4 cites·18 claims
- 0991US9316915B2Negative resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2014·Granted Apr 19, 2016·8 cites·5 claims
- 1090US11009793B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted May 18, 2021·4 cites·17 claims
- 1190US9429846B2Pattern forming process and shrink agentSHINETSU CHEMICAL CO·Filed 2014·Granted Aug 30, 2016·6 cites·8 claims
- 1289US9081290B2Patterning process and resist compositionSHINETSU CHEMICAL CO·Filed 2013·Granted Jul 14, 2015·6 cites·15 claims
- 1389US8900793B2Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist compositionSAGEHASHI MASAYOSHI·Filed 2012·Granted Dec 2, 2014·7 cites·8 claims
- 1487US12013639B2Positive resist material and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jun 18, 2024·1 cites·10 claims
- 1587US10023674B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 17, 2018·3 cites·11 claims
- 1687US8535869B2Sulfonium salt, resist composition, and patterning processOHSAWA YOUICHI·Filed 2011·Granted Sep 17, 2013·7 cites·6 claims
- 1786US9335633B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted May 10, 2016·3 cites·8 claims
- 1886US9244350B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jan 26, 2016·4 cites·13 claims
- 1985US9182668B2Patterning process, resist composition, polymer, and monomerSHINETSU CHEMICAL CO·Filed 2014·Granted Nov 10, 2015·4 cites·13 claims
- 2083US10131730B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 20, 2018·2 cites·12 claims
- 2182US8900796B2Acid generator, chemically amplified resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Dec 2, 2014·3 cites·15 claims
- 2281US10216085B2Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured filmSHINETSU CHEMICAL CO·Filed 2017·Granted Feb 26, 2019·2 cites·8 claims
- 2381US9740100B2Hemiacetal compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 22, 2017·2 cites·11 claims
- 2481US9256127B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Feb 9, 2016·2 cites·17 claims
- 2580US11548844B2Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Jan 10, 2023·1 cites·10 claims
- 2679US9115074B2Fluorinated monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Aug 25, 2015·2 cites·1 claims
- 2776US9657115B2Polymer compound for a conductive polymer and method for manufacturing sameSHINETSU CHEMICAL CO·Filed 2014·Granted May 23, 2017·2 cites·1 claims
- 2876US9366963B2Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2014·Granted Jun 14, 2016·2 cites·14 claims
- 2976US9213235B2Patterning process, resist composition, polymer, and monomerSHINETSU CHEMICAL CO·Filed 2014·Granted Dec 15, 2015·2 cites·13 claims
- 3076US9086624B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Jul 21, 2015·1 cites·12 claims
- 3175US9122155B2Sulfonium salt, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Sep 1, 2015·1 cites·18 claims
- 3275US9029064B2Patterning process and resist compositionHATAKEYAMA JUN·Filed 2012·Granted May 12, 2015·2 cites·17 claims
- 3374US10591819B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Mar 17, 2020·0 cites·8 claims
- 3474US9250517B2Polymer, positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Feb 2, 2016·2 cites·9 claims
- 3574US8628908B2Chemically amplified resist composition and patterning processWATANABE TAKERU·Filed 2012·Granted Jan 14, 2014·2 cites·8 claims
- 3673US8808964B2Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2011·Granted Aug 19, 2014·1 cites·4 claims
- 3771US11435666B2Salt compound, chemically amplified resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Sep 6, 2022·1 cites·21 claims
- 3871US2025291251A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 3970US9250522B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Feb 2, 2016·1 cites·8 claims
- 4070US9046772B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jun 2, 2015·1 cites·13 claims
- 4170US8877424B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Nov 4, 2014·1 cites·11 claims
- 4269US9458144B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Oct 4, 2016·1 cites·4 claims
- 4369US2023244142A1Polymer, resist composition, and pattern forming methodSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 4468US8968979B2Positive resist composition and patterning processTAKEMURA KATSUYA·Filed 2009·Granted Mar 3, 2015·2 cites·16 claims
- 4567US2023107121A1Positive resist material and patterning processSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 4666US2023305398A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 4765US9709890B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Jul 18, 2017·1 cites·3 claims
- 4865US9632415B2Pattern forming process and shrink agentSHINETSU CHEMICAL CO·Filed 2015·Granted Apr 25, 2017·1 cites·10 claims
- 4965US2023205083A1Salt compound, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 5065US2024118617A1Polymer, Resist Composition, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
Showing the top 50 of 85 patent records by PatentIndex Score.
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