Assignee
SAGEHASHI MASAYOSHI
JP·6 granted patents·18 citations·filing 2011–2012
Top patents by PatentIndex Score
6 records- 0193US8597869B2Sulfonium salt, resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2011·Granted Dec 3, 2013·10 cites·7 claims
- 0289US8900793B2Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist compositionSAGEHASHI MASAYOSHI·Filed 2012·Granted Dec 2, 2014·7 cites·8 claims
- 0373US8808964B2Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2011·Granted Aug 19, 2014·1 cites·4 claims
- 0456US8647808B2Fluorinated monomer, polymer, resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2011·Granted Feb 11, 2014·0 cites·15 claims
- 0548US8686166B2Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefromSAGEHASHI MASAYOSHI·Filed 2012·Granted Apr 1, 2014·0 cites·3 claims
- 0641US9207534B2Nitrogen-containing monomer, polymer, resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2012·Granted Dec 8, 2015·0 cites·13 claims
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