Inventor · disambiguated record
Keizo Hirose
Also filed as: HIROSE KEIZO
19 granted patents·7 pending applications·1,477 citations·filing 1995–2014
96Inventor score
Top patents by PatentIndex Score
26 records- 0197US6544380B2Plasma treatment method and apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Apr 8, 2003·104 cites·3 claims
- 0297US6074518APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jun 13, 2000·276 cites·3 claims
- 0397US5919332APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Jul 6, 1999·445 cites·15 claims
- 0496US5698062APlasma treatment apparatus and methodTOKYO ELECTRON LTD·Filed 1995·Granted Dec 16, 1997·161 cites·3 claims
- 0593US7537672B1Apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2000·Granted May 26, 2009·44 cites·5 claims
- 0691US6391147B2Plasma treatment method and apparatusTOKYO ELECTRON LTD·Filed 2000·Granted May 21, 2002·49 cites·5 claims
- 0788US6106737APlasma treatment method utilizing an amplitude-modulated high frequency powerTOKYO ELECTRON LTD·Filed 1998·Granted Aug 22, 2000·66 cites·4 claims
- 0887US6432212B1Substrate washing methodTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·35 cites·5 claims
- 0986US6012858AApparatus and method for forming liquid filmTOKYO ELECTRON LTD·Filed 1998·Granted Jan 11, 2000·82 cites·9 claims
- 1081US7364626B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Apr 29, 2008·26 cites·17 claims
- 1179US8080126B2Plasma processing apparatusKOSHIISHI AKIRA·Filed 2008·Granted Dec 20, 2011·4 cites·4 claims
- 1278US6385805B2Scrubbing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted May 14, 2002·55 cites·5 claims
- 1378US6165270AProcess solution supplying apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Dec 26, 2000·41 cites·16 claims
- 1477US6554010B1Substrate cleaning tool, having permeable cleaning headTOKYO ELECTRON LTD·Filed 2000·Granted Apr 29, 2003·23 cites·21 claims
- 1571US6175983B1Substrate washing apparatus and methodTOKYO ELECTRON LTD·Filed 1998·Granted Jan 23, 2001·34 cites·14 claims
- 1668US9960069B2Joining device and joining systemTOKYO ELECTRON LTD·Filed 2014·Granted May 1, 2018·2 cites·9 claims
- 1767US6431258B1Process solution supplying apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·8 cites·6 claims
- 1862US6300043B1Method of forming resist filmTOKYO ELECTRON LTD·Filed 1998·Granted Oct 9, 2001·20 cites·16 claims
- 1957US2013112666A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 2052US2010326601A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 2149US7010826B2Substrate cleaning tool and substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Mar 14, 2006·2 cites·13 claims
- 2247US2005061445A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 2345US2008305408A1Aperture mask, manufacturing method thereof, charge beam lithography apparatus, and charge beam lithography methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2442US2014208556A1Joining device and joining systemTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2541US2007148985A1Method of manufacturing trench structure for deviceMIZUTANI NOBUTAKA·Filed 2007·Application pending·0 cites
- 2633US2013327463A1Joining method, joining device and joining systemKITAHARA SHIGENORI·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →