Inventor · disambiguated record
Sunit S. Dixit
Also filed as: DIXIT SUNIT S
17 granted patents·188 citations·filing 1980–1999
94Inventor score
Files withCLARIANT FINANCE BVI LTD6MORTON INT INC6RICHARDSON GRAPHIC CO2THIOKOL MORTON INC2HOECHST CELANESE CORP1
Top patents by PatentIndex Score
17 records- 0182US4943511AHigh sensitivity mid and deep UV resistTHIOKOL MORTON INC·Filed 1989·Granted Jul 24, 1990·34 cites·9 claims
- 0272US4920028AHigh contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinoneTHIOKOL MORTON INC·Filed 1988·Granted Apr 24, 1990·22 cites·6 claims
- 0368US5225312APositive photoresist containing dyesMORTON INT INC·Filed 1991·Granted Jul 6, 1993·24 cites·8 claims
- 0466US4399243ACleaner and scratch remover compositionRICHARDSON GRAPHIC CO·Filed 1980·Granted Aug 16, 1983·20 cites·26 claims
- 0559US5739265AFractionation of phenol formaldehyde condensate and photoresist compositions produced therefromCLARIANT FINANCE BVI LTD·Filed 1995·Granted Apr 14, 1998·13 cites·20 claims
- 0654US6106995AAntireflective coating material for photoresistsCLARIANT FINANCE BVI LTD·Filed 1999·Granted Aug 22, 2000·14 cites·17 claims
- 0748US5693749AFractionation of phenol formaldehyde condensate and photoresist compositions produced therefromHOECHST CELANESE CORP·Filed 1995·Granted Dec 2, 1997·11 cites·23 claims
- 0843US5928836AFractionated novolak resin copolymer and photoresist composition therefromCLARIANT FINANCE BVI LTD·Filed 1997·Granted Jul 27, 1999·11 cites·15 claims
- 0943US5182184ANovolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefromMORTON INT INC·Filed 1990·Granted Jan 26, 1993·7 cites·20 claims
- 1042US5208138AHigh contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl contentMORTON INT INC·Filed 1992·Granted May 4, 1993·7 cites·3 claims
- 1141US5853947AQuinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetateCLARIANT FINANCE BVI LTD·Filed 1995·Granted Dec 29, 1998·7 cites·12 claims
- 1237US5719004APositive photoresist composition containing a 2,4-dinitro-1-naphtholCLARIANT FINANCE BVI LTD·Filed 1996·Granted Feb 17, 1998·5 cites·16 claims
- 1333US5130409AMixed aldehyde novolak resins useful as high contrast high thermal stability positive photoresistsMORTON INT INC·Filed 1990·Granted Jul 14, 1992·3 cites·1 claims
- 1433US4997734AMethod of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrateMORTON INT INC·Filed 1989·Granted Mar 5, 1991·2 cites·10 claims
- 1533US4996122AMethod of forming resist pattern and thermally stable and highly resolved resist patternMORTON INT INC·Filed 1990·Granted Feb 26, 1991·3 cites·17 claims
- 1632US5976761AFractionation of phenol formaldehyde condensate and photoresist compositions produced therefromCLARIANT FINANCE BVI LTD·Filed 1998·Granted Nov 2, 1999·1 cites·8 claims
- 1726US4400481AFinisher and preserver for lithographic platesRICHARDSON GRAPHIC CO·Filed 1982·Granted Aug 23, 1983·4 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →