Inventor · disambiguated record
Akiyoshi Yamazaki
Also filed as: YAMAZAKI AKIYOSHI
20 granted patents·6 pending applications·245 citations·filing 1996–2021
94Inventor score
Top patents by PatentIndex Score
26 records- 0185US5736296APositive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compoundTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Apr 7, 1998·46 cites·24 claims
- 0275US5908730AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jun 1, 1999·35 cites·19 claims
- 0375US5817444APositive-working photoresist composition and multilayered resist material using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Oct 6, 1998·35 cites·21 claims
- 0472US6340553B1Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Jan 22, 2002·26 cites·14 claims
- 0561US11780946B2Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Oct 10, 2023·0 cites·10 claims
- 0661US5955240APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 21, 1999·23 cites·9 claims
- 0760US5948589APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 7, 1999·20 cites·8 claims
- 0859US5770343APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Jun 23, 1998·15 cites·9 claims
- 0958US2009311625A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2009·Application pending·0 cites
- 1057US6159652APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Dec 12, 2000·12 cites·4 claims
- 1156US2008227027A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2008·Application pending·0 cites
- 1255US11560444B2Method of producing block copolymer capable of creating specific structure patternTOKYO OHKA KOGYO CO LTD·Filed 2020·Granted Jan 24, 2023·0 cites·7 claims
- 1353US2007141514A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2007·Application pending·0 cites
- 1450US2005266346A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2005·Application pending·0 cites
- 1549US10941253B2Block copolymer, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Mar 9, 2021·0 cites·12 claims
- 1648US5945248AChemical-sensitization positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Aug 31, 1999·14 cites·9 claims
- 1748US5874195APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Feb 23, 1999·9 cites·7 claims
- 1846US7741008B2Positive resist composition, positive resist composition for thermal flow, and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jun 22, 2010·0 cites·8 claims
- 1943US11261299B2Block copolymer and method of producing the same, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Mar 1, 2022·0 cites·5 claims
- 2043US2004248033A1Method for forming photoresist pattern and photoresist laminateFiled 2004·Application pending·0 cites
- 2142US6485887B2Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Nov 26, 2002·4 cites·4 claims
- 2241US2003129534A1Method for forming photoresist pattern and photoresist laminateFiled 2002·Application pending·0 cites
- 2337US7629105B2Positive photoresist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Dec 8, 2009·0 cites·13 claims
- 2437US5854357AProcess for the production of polyhydroxstyreneTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Dec 29, 1998·3 cites·5 claims
- 2532USRE38254EPositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Sep 16, 2003·1 cites·14 claims
- 2632US5856058AChemical-sensitization positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Jan 5, 1999·2 cites·48 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →