Inventor · disambiguated record
Eric Kent
Also filed as: KENT ERIC · KENT ERIC R · KENT ERIC RICHARD
20 granted patents·282 citations·filing 1999–2018
95Inventor score
Top patents by PatentIndex Score
20 records- 0196US9804504B2Method and apparatus for design of a metrology targetASML NETHERLANDS BV·Filed 2016·Granted Oct 31, 2017·13 cites·20 claims
- 0295US9355200B2Method and apparatus for design of a metrology targetASML NETHERLANDS BV·Filed 2014·Granted May 31, 2016·16 cites·20 claims
- 0383US6051348AMethod for detecting malfunction in photolithographic fabrication trackADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 18, 2000·54 cites·11 claims
- 0480US6245584B1Method for detecting adjustment error in photolithographic stepping printerADVANCED MICRO DEVICES INC·Filed 1999·Granted Jun 12, 2001·60 cites·13 claims
- 0579US6170494B1Method for automatically cleaning resist nozzleADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 9, 2001·28 cites·4 claims
- 0674US10296681B2Process based metrology target designASML NETHERLANDS BV·Filed 2018·Granted May 21, 2019·1 cites·23 claims
- 0774US6318913B2Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developerADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 20, 2001·16 cites·26 claims
- 0873US10007744B2Process based metrology target designASML NETHERLANDS BV·Filed 2015·Granted Jun 26, 2018·2 cites·20 claims
- 0973US6336960B1System and method for purging air bubbles from filtersADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 8, 2002·23 cites·9 claims
- 1065US6482573B1Exposure correction based on reflective index for photolithographic process controlADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 19, 2002·8 cites·7 claims
- 1164US6418946B1Apparatus for automatically cleaning resist nozzleADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 16, 2002·12 cites·3 claims
- 1264US6250822B1Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developerADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 26, 2001·9 cites·21 claims
- 1360US6130016AMethod for forming semiconductor structures using a calibrating reticleADVANCED MICRO DEVICES INC·Filed 1999·Granted Oct 10, 2000·19 cites·22 claims
- 1453US6368985B1Dual track/stepper interface configuration for wafer processingADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 9, 2002·5 cites·20 claims
- 1549US6361599B1Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splashADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 26, 2002·2 cites·11 claims
- 1641US6529623B1Stepper lens specific reticle compensation for critical dimension controlADVANCED MICRO DEVICES INC·Filed 1999·Granted Mar 4, 2003·7 cites·2 claims
- 1736US6360959B1Dual resist dispense nozzle for wafer tracksADVANCED MICRO DEVICES INC·Filed 2000·Granted Mar 26, 2002·0 cites·20 claims
- 1835US6238747B1Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splashADVANCED MICRO DEVICES INC·Filed 1999·Granted May 29, 2001·4 cites·3 claims
- 1932US6082379AMechanism for cleaning an integrated circuit wafer hot plate while the hot plate is at operating temperatureADVANCED MICRO DEVICES INC·Filed 1999·Granted Jul 4, 2000·3 cites·15 claims
- 2029US6299688B1Developer nozzle clean combsADVANCED MICRO DEVICES INC·Filed 1999·Granted Oct 9, 2001·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →