Inventor · disambiguated record
Kimio Motoda
Also filed as: MOTODA KIMIO
21 granted patents·3 pending applications·1,103 citations·filing 1995–2025
97Inventor score
Files withTOKYO ELECTRON LTD24
Top patents by PatentIndex Score
24 records- 0195US5695817AMethod of forming a coating filmTOKYO ELECTRON LTD·Filed 1995·Granted Dec 9, 1997·92 cites·28 claims
- 0294US5803970AMethod of forming a coating film and coating apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Sep 8, 1998·82 cites·38 claims
- 0394US5718763AResist processing apparatus for a rectangular substrateTOKYO ELECTRON LTD·Filed 1995·Granted Feb 17, 1998·154 cites·7 claims
- 0493US7905195B2Floating-type substrate conveying and processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Mar 15, 2011·34 cites·5 claims
- 0592US5919520ACoating method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 1997·Granted Jul 6, 1999·105 cites·16 claims
- 0691US6159288AMethod and apparatus for cleaning treatmentTOKYO ELECTRON LTD·Filed 1997·Granted Dec 12, 2000·57 cites·10 claims
- 0791US5762708ACoating apparatus thereforTOKYO ELECTRON LTD·Filed 1995·Granted Jun 9, 1998·107 cites·14 claims
- 0891US5688322AApparatus for coating resist on substrateTOKYO ELECTRON LTD·Filed 1996·Granted Nov 18, 1997·89 cites·16 claims
- 0990US6514343B1Coating apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Feb 4, 2003·52 cites·13 claims
- 1083US5853812AMethod and apparatus for processing substratesTOKYO ELECTRON LTD·Filed 1997·Granted Dec 29, 1998·40 cites·14 claims
- 1182US6010570AApparatus for forming coating film for semiconductor processingTOKYO ELECTRON LTD·Filed 1997·Granted Jan 4, 2000·67 cites·24 claims
- 1280US9238245B2Coating apparatus and method for filling coating liquidTOKYO ELECTRON LTD·Filed 2013·Granted Jan 19, 2016·5 cites·10 claims
- 1378US6749688B2Coating method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 1999·Granted Jun 15, 2004·47 cites·8 claims
- 1475US6168665B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jan 2, 2001·46 cites·9 claims
- 1575US6013317ACoating apparatus and method thereforTOKYO ELECTRON LTD·Filed 1998·Granted Jan 11, 2000·38 cites·12 claims
- 1674US5906860AApparatus for treating a substrate with resist and resist-treating methodTOKYO ELECTRON LTD·Filed 1997·Granted May 25, 1999·49 cites·27 claims
- 1768US6398879B1Method and apparatus for cleaning treatmentTOKYO ELECTRON LTD·Filed 2000·Granted Jun 4, 2002·10 cites·6 claims
- 1865US2023014665A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1955US2024282617A1Substrate processing apparatus and substrate placing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2054US11482431B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Oct 25, 2022·0 cites·11 claims
- 2153US2025293065A1Bonding apparatus and bonding methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2251US6058544AScrubbing apparatus and scrubbing methodTOKYO ELECTRON LTD·Filed 1998·Granted May 9, 2000·17 cites·15 claims
- 2350US5853803AResist processing method and apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Dec 29, 1998·12 cites·7 claims
- 2441US10964563B2Bonding apparatus and bonding methodTOKYO ELECTRON LTD·Filed 2018·Granted Mar 30, 2021·0 cites·10 claims
Join the waitlist — get patent alerts
Get an alert when Kimio Motoda files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →