Inventor · disambiguated record
Mitsuhiro Sakai
Also filed as: SAKAI MITSUHIRO
18 granted patents·731 citations·filing 1996–2002
96Inventor score
Files withTOKYO ELECTRON LTD18
Top patents by PatentIndex Score
18 records- 0191US6159288AMethod and apparatus for cleaning treatmentTOKYO ELECTRON LTD·Filed 1997·Granted Dec 12, 2000·57 cites·10 claims
- 0289US6447608B1Spin coating apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Sep 10, 2002·43 cites·10 claims
- 0388US6458208B1Film forming apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Oct 1, 2002·40 cites·5 claims
- 0487US5815762AProcessing apparatus and processing methodTOKYO ELECTRON LTD·Filed 1997·Granted Sep 29, 1998·104 cites·30 claims
- 0585US6443641B2Substrate process method and substrate process apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Sep 3, 2002·28 cites·7 claims
- 0684US6770149B2Method and apparatus for cleaning treatmentTOKYO ELECTRON LTD·Filed 2002·Granted Aug 3, 2004·19 cites·5 claims
- 0780US6159541ASpin coating processTOKYO ELECTRON LTD·Filed 1998·Granted Dec 12, 2000·50 cites·20 claims
- 0880US6090205AApparatus for processing substrateTOKYO ELECTRON LTD·Filed 1998·Granted Jul 18, 2000·50 cites·14 claims
- 0980US5945161AApparatus and method for supplying process solution to surface of substrate to be processedTOKYO ELECTRON LTD·Filed 1997·Granted Aug 31, 1999·60 cites·21 claims
- 1076US6261007B1Substrate process method and substrate process apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jul 17, 2001·43 cites·6 claims
- 1175US6168665B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jan 2, 2001·46 cites·9 claims
- 1275US6165552AFilm forming methodTOKYO ELECTRON LTD·Filed 1998·Granted Dec 26, 2000·41 cites·9 claims
- 1374US6062240ATreatment deviceTOKYO ELECTRON LTD·Filed 1998·Granted May 16, 2000·45 cites·29 claims
- 1471US6391110B1Method and apparatus for cleaning treatmentTOKYO ELECTRON LTD·Filed 2000·Granted May 21, 2002·15 cites·4 claims
- 1568US6398879B1Method and apparatus for cleaning treatmentTOKYO ELECTRON LTD·Filed 2000·Granted Jun 4, 2002·10 cites·6 claims
- 1668US5853961AMethod of processing substrate and apparatus for processing substrateTOKYO ELECTRON LTD·Filed 1996·Granted Dec 29, 1998·29 cites·8 claims
- 1767US6238511B1Method and apparatus for processing substrateTOKYO ELECTRON LTD·Filed 1998·Granted May 29, 2001·34 cites·11 claims
- 1850US6203218B1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 1999·Granted Mar 20, 2001·17 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →