Inventor · disambiguated record
Akitoshi Harada
Also filed as: HARADA AKITOSHI
13 granted patents·3 pending applications·14 citations·filing 2002–2021
84Inventor score
Top patents by PatentIndex Score
16 records- 0173US10217616B2Method of controlling temperature and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Feb 26, 2019·3 cites·15 claims
- 0270US10043637B2Plasma processing apparatus and particle adhesion preventing methodTOKYO ELECTRON LTD·Filed 2017·Granted Aug 7, 2018·1 cites·7 claims
- 0357US7125806B2Etching methodTOKYO ELECTRON LTD·Filed 2002·Granted Oct 24, 2006·8 cites·12 claims
- 0455US2014373867A1Cleaning method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 0551US9330891B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted May 3, 2016·0 cites·14 claims
- 0649US12388383B2Controller for rotary electric machineMITSUBISHI ELECTRIC CORP·Filed 2021·Granted Aug 12, 2025·0 cites·18 claims
- 0749US9209041B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Dec 8, 2015·0 cites·8 claims
- 0848US12017707B2Motor control system and power steering systemNIDEC CORP·Filed 2019·Granted Jun 25, 2024·0 cites·7 claims
- 0948US11362608B2Motor control system and power steering systemNIDEC CORP·Filed 2019·Granted Jun 14, 2022·0 cites·19 claims
- 1047US9953862B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Apr 24, 2018·0 cites·16 claims
- 1147US2015170891A1Particle backflow preventing part and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1245US7119011B2Semiconductor device and manufacturing method thereofTOKYO ELECTRON LTD·Filed 2004·Granted Oct 10, 2006·2 cites·7 claims
- 1344US7608544B2Etching method and storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Oct 27, 2009·0 cites·11 claims
- 1443US9460896B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Oct 4, 2016·0 cites·11 claims
- 1534US10192719B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2015·Granted Jan 29, 2019·0 cites·8 claims
- 1629US2015243489A1Cleaning method for plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →