Inventor · disambiguated record
Go Noya
Also filed as: NOYA GO
11 granted patents·6 pending applications·22 citations·filing 2007–2018
83Inventor score
Files withNOYA GO6AZ ELECTRONIC MAT LUXEMBOURG SARL3AZ ELECTRONIC MAT (LUXEMBOURG) S A R L2MERCK PATENT GMBH2AKIYAMA YASUSHI1
Top patents by PatentIndex Score
17 records- 0173US7998664B2Processing liquid for resist substrate and method of processing resist substrate using the sameAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Aug 16, 2011·4 cites·9 claims
- 0270US9152052B2Composition for forming tungsten oxide film and method for producing tungsten oxide film using sameNOYA GO·Filed 2012·Granted Oct 6, 2015·2 cites·17 claims
- 0369US8101333B2Method for formation of miniaturized pattern and resist substrate treatment solution for use in the methodNOYA GO·Filed 2007·Granted Jan 24, 2012·13 cites·15 claims
- 0466US11161982B2Film forming composition and film forming method using the sameMERCK PATENT GMBH·Filed 2018·Granted Nov 2, 2021·0 cites·17 claims
- 0564US9360756B2Composition for forming fine resist pattern and pattern formation method using sameYAMAMOTO KAZUMA·Filed 2013·Granted Jun 7, 2016·2 cites·12 claims
- 0660US8501394B2Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-patternTAKANO YUSUKE·Filed 2009·Granted Aug 6, 2013·1 cites·10 claims
- 0754US11059995B2Film forming compositionMERCK PATENT GMBH·Filed 2018·Granted Jul 13, 2021·0 cites·20 claims
- 0843US2010279235A1Composition for formation of top anti-reflective film, and pattern formation method using the compositionNOYA GO·Filed 2008·Application pending·0 cites
- 0941US10451971B2Composition for forming underlayer and method for forming underlayer therewithAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2016·Granted Oct 22, 2019·0 cites·14 claims
- 1040US2010028817A1Solution for treatment of resist substrate after development processing and method for treatment of resist substrate using the sameNOYA GO·Filed 2007·Application pending·0 cites
- 1139US2010003468A1Method of forming microfined resist patternNOYA GO·Filed 2007·Application pending·0 cites
- 1238US2010062363A1Composition for upper surface antireflection film, and method for pattern formation using the sameNOYA GO·Filed 2007·Application pending·0 cites
- 1337US9494867B2Rinsing liquid for lithography and pattern forming method using sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Nov 15, 2016·0 cites·16 claims
- 1436US8568955B2Composition for formation of top antireflective film, and pattern formation method using the compositionAKIYAMA YASUSHI·Filed 2008·Granted Oct 29, 2013·0 cites·8 claims
- 1533US2019048129A1A polymer, composition, forming sacrificial layer and method for semiconductor device therewithAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Application pending·0 cites
- 1631US10435555B2Void forming composition, semiconductor device provided with voids formed using composition, and method for manufacturing semiconductor device using compositionAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2015·Granted Oct 8, 2019·0 cites·15 claims
- 1730US2017218227A1Sacrificial film composition, method for preparing same, semiconductor device having voids formed using said composition, and method for manufacturing semiconductor device using said compositionAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →