Inventor · disambiguated record
Bruno W. Schueler
Also filed as: SCHUELER BRUNO · SCHUELER BRUNO W
27 granted patents·1 pending application·276 citations·filing 1989–2024
96Inventor score
Files withNOVA MEASURING INSTR INC13REVERA INC6DECECCO PAOLA3CHARLES EVANS & ASSOCIATES1FANTON JEFFREY T1
Top patents by PatentIndex Score
28 records- 0197US9588066B2Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)POIS HEATH A·Filed 2014·Granted Mar 7, 2017·44 cites·10 claims
- 0295US10119925B2Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)NOVA MEASURING INSTR INC·Filed 2017·Granted Nov 6, 2018·7 cites·25 claims
- 0395US5128543AParticle analyzer apparatus and methodCHARLES EVANS & ASSOCIATES·Filed 1989·Granted Jul 7, 1992·86 cites·9 claims
- 0493US7420163B2Determining layer thickness using photoelectron spectroscopyREVERA INC·Filed 2005·Granted Sep 2, 2008·21 cites·28 claims
- 0593US7411188B2Method and system for non-destructive distribution profiling of an element in a filmREVERA INC·Filed 2005·Granted Aug 12, 2008·24 cites·13 claims
- 0692US10481112B2Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)NOVA MEASURING INSTR INC·Filed 2018·Granted Nov 19, 2019·4 cites·20 claims
- 0791US10859519B2Methods and systems for measuring periodic structures using multi-angle x-ray reflectance scatterometry (XRS)NOVA MEASURING INSTR INC·Filed 2019·Granted Dec 8, 2020·3 cites·25 claims
- 0891US10056242B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2016·Granted Aug 21, 2018·5 cites·13 claims
- 0991US7884321B2Method and system for non-destructive distribution profiling of an element in a filmREVERA INC·Filed 2008·Granted Feb 8, 2011·10 cites·4 claims
- 1090US11996259B2Patterned x-ray emitting targetNOVA MEASURING INSTR INC·Filed 2020·Granted May 28, 2024·2 cites·16 claims
- 1190US8269167B2Method and system for non-destructive distribution profiling of an element in a filmDECECCO PAOLA·Filed 2011·Granted Sep 18, 2012·9 cites·8 claims
- 1288US12360063B2System and method for measuring a sample by x-ray reflectance scatterometryNOVA MEASURING INSTR INC·Filed 2024·Granted Jul 15, 2025·0 cites·20 claims
- 1386US12165863B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2023·Granted Dec 10, 2024·0 cites·18 claims
- 1482US11764050B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2022·Granted Sep 19, 2023·0 cites·20 claims
- 1582US9201030B2Method and system for non-destructive distribution profiling of an element in a filmDECECCO PAOLA·Filed 2014·Granted Dec 1, 2015·2 cites·4 claims
- 1681US5637879AFocused ion beam column with electrically variable blanking apertureFiled 1996·Granted Jun 10, 1997·39 cites·4 claims
- 1780US9240254B2System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopySCHUELER BRUNO W·Filed 2011·Granted Jan 19, 2016·5 cites·16 claims
- 1880US7231324B2Techniques for analyzing data generated by instrumentsREVERA INC·Filed 2005·Granted Jun 12, 2007·8 cites·24 claims
- 1977US8610059B2Method and system for non-destructive distribution profiling of an element in a filmDECECCO PAOLA·Filed 2012·Granted Dec 17, 2013·2 cites·11 claims
- 2076US11430647B2Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass SpectrometryNOVA MEASURING INSTR INC·Filed 2021·Granted Aug 30, 2022·0 cites·21 claims
- 2173US10910208B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2020·Granted Feb 2, 2021·0 cites·20 claims
- 2270US8011830B2Method and system for calibrating an X-ray photoelectron spectroscopy measurementREVERA INC·Filed 2009·Granted Sep 6, 2011·2 cites·26 claims
- 2370US7399963B2Photoelectron spectroscopy apparatus and method of useREVERA INC·Filed 2005·Granted Jul 15, 2008·3 cites·65 claims
- 2469US10636644B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2019·Granted Apr 28, 2020·0 cites·7 claims
- 2566US10403489B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2018·Granted Sep 3, 2019·0 cites·22 claims
- 2663US2025006451A1Patterned x-ray emitting targetNOVA MEASURING INSTR INC·Filed 2024·Application pending·0 cites
- 2754US8916823B2Method and system for non-destructive distribution profiling of an element in a filmREVARA INC·Filed 2013·Granted Dec 23, 2014·0 cites·12 claims
- 2848US9297771B2Methods and systems for fabricating platelets of a monochromator for X-ray photoelectron spectroscopyFANTON JEFFREY T·Filed 2013·Granted Mar 29, 2016·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →