Inventor · disambiguated record
Junzou Azuma
Also filed as: AZUMA JUNZOU
18 granted patents·2,023 citations·filing 1990–1999
97Inventor score
Files withHITACHI LTD18
Top patents by PatentIndex Score
18 records- 0198US5134965AProcessing apparatus and method for plasma processingHITACHI LTD·Filed 1990·Granted Aug 4, 1992·866 cites·21 claims
- 0296US5825035AProcessing method and apparatus using focused ion beam generating meansHITACHI LTD·Filed 1996·Granted Oct 20, 1998·140 cites·16 claims
- 0395US5504340AProcess method and apparatus using focused ion beam generating meansHITACHI LTD·Filed 1994·Granted Apr 2, 1996·94 cites·37 claims
- 0493US6303932B1Method and its apparatus for detecting a secondary electron beam image and a method and its apparatus for processing by using focused charged particle beamHITACHI LTD·Filed 1998·Granted Oct 16, 2001·84 cites·19 claims
- 0593US5583344AProcess method and apparatus using focused ion beam generating meansHITACHI LTD·Filed 1996·Granted Dec 10, 1996·73 cites·6 claims
- 0693US4985109AApparatus for plasma processingHITACHI LTD·Filed 1990·Granted Jan 15, 1991·99 cites·49 claims
- 0792US6587581B1Visual inspection method and apparatus thereforHITACHI LTD·Filed 1998·Granted Jul 1, 2003·118 cites·59 claims
- 0891US5683547AProcessing method and apparatus using focused energy beamHITACHI LTD·Filed 1994·Granted Nov 4, 1997·156 cites·5 claims
- 0990US5976328APattern forming method using charged particle beam process and charged particle beam processing systemHITACHI LTD·Filed 1997·Granted Nov 2, 1999·58 cites·7 claims
- 1090US5358806APhase shift mask, method of correcting the same and apparatus for carrying out the methodHITACHI LTD·Filed 1992·Granted Oct 25, 1994·70 cites·25 claims
- 1187US5223109AIon beam processing method and apparatusHITACHI LTD·Filed 1991·Granted Jun 29, 1993·52 cites·5 claims
- 1285US5952658AMethod and system for judging milling end point for use in charged particle beam milling systemHITACHI LTD·Filed 1997·Granted Sep 14, 1999·47 cites·35 claims
- 1384US6476387B1Method and apparatus for observing or processing and analyzing using a charged beamHITACHI LTD·Filed 1999·Granted Nov 5, 2002·44 cites·22 claims
- 1484US5342448AApparatus for processing a sample using a charged beam and reactive gasesHITACHI LTD·Filed 1993·Granted Aug 30, 1994·39 cites·14 claims
- 1580US5447614AMethod of processing a sample using a charged beam and reactive gases and system employing the sameHITACHI LTD·Filed 1994·Granted Sep 5, 1995·31 cites·8 claims
- 1672US5439763AOptical mask and method of correcting the sameHITACHI LTD·Filed 1993·Granted Aug 8, 1995·24 cites·24 claims
- 1767US6507029B1Sample processing apparatus and method for removing charge on sample through light irradiationHITACHI LTD·Filed 1999·Granted Jan 14, 2003·20 cites·9 claims
- 1852US6344115B1Pattern forming method using charged particle beam process and charged particle beam processing systemHITACHI LTD·Filed 1999·Granted Feb 5, 2002·8 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →