Inventor · disambiguated record
Sairaju Tallavarjula
Also filed as: TALLAVARJULA SAIRAJU
12 granted patents·89 citations·filing 2002–2021
88Inventor score
Top patents by PatentIndex Score
12 records- 0191US9558982B2Minimal contact edge ring for rapid thermal processingAPPLIED MATERIALS INC·Filed 2013·Granted Jan 31, 2017·12 cites·15 claims
- 0289US6803297B2Optimal spike anneal ambientAPPLIED MATERIALS INC·Filed 2002·Granted Oct 12, 2004·49 cites·20 claims
- 0388US8101906B2Method and apparatus for calibrating optical path degradation useful for decoupled plasma nitridation chambersTALLAVARJULA SAIRAJU·Filed 2008·Granted Jan 24, 2012·14 cites·11 claims
- 0475US9403251B2Minimal contact edge ring for rapid thermal processingAPPLIED MATERIALS INC·Filed 2013·Granted Aug 2, 2016·3 cites·19 claims
- 0574US11077410B2Gas injector with baffleAPPLIED MATERIALS INC·Filed 2018·Granted Aug 3, 2021·1 cites·19 claims
- 0674US10892147B2Method and apparatus for calibrating optical path degradation useful for decoupled plasma nitridation chambersAPPLIED MATERIALS INC·Filed 2018·Granted Jan 12, 2021·1 cites·6 claims
- 0773US7813895B2Methods for plasma matching between different chambers and plasma stability monitoring and controlAPPLIED MATERIALS INC·Filed 2007·Granted Oct 12, 2010·7 cites·22 claims
- 0871US9865438B2Method and apparatus for calibrating optical path degradation useful for decoupled plasma nitridation chambersTALLAVARJULA SAIRAJU·Filed 2011·Granted Jan 9, 2018·2 cites·8 claims
- 0968US11529592B2Gas injector with baffleAPPLIED MATERIALS INC·Filed 2021·Granted Dec 20, 2022·0 cites·20 claims
- 1065US11885021B2Gas supply member with baffleAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·0 cites·19 claims
- 1154US11124878B2Gas supply member with baffleAPPLIED MATERIALS INC·Filed 2018·Granted Sep 21, 2021·0 cites·17 claims
- 1242US11615944B2Remote plasma oxidation chamberAPPLIED MATERIALS INC·Filed 2018·Granted Mar 28, 2023·0 cites·20 claims
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