Inventor · disambiguated record
Lara Hawrylchak
Also filed as: HAWRYLCHAK LARA · HAWRYLCHAK LARA A
62 granted patents·23 pending applications·181 citations·filing 2008–2025
98Inventor score
Top patents by PatentIndex Score
85 records- 0196US11348769B2Plasma-enhanced anneal chamber for wafer outgassingAPPLIED MATERIALS INC·Filed 2020·Granted May 31, 2022·5 cites·12 claims
- 0296US9683308B2Method and apparatus for precleaning a substrate surface prior to epitaxial growthAPPLIED MATERIALS INC·Filed 2014·Granted Jun 20, 2017·8 cites·7 claims
- 0396US8070925B2Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter targetHOFFMAN DANIEL J·Filed 2008·Granted Dec 6, 2011·36 cites·18 claims
- 0494US11959169B2Asymmetric injection for better wafer uniformityAPPLIED MATERIALS INC·Filed 2022·Granted Apr 16, 2024·2 cites·10 claims
- 0594US8580092B2Adjustable process spacing, centering, and improved gas conductanceHAWRYLCHAK LARA·Filed 2011·Granted Nov 12, 2013·14 cites·9 claims
- 0692US11486038B2Asymmetric injection for better wafer uniformityAPPLIED MATERIALS INC·Filed 2020·Granted Nov 1, 2022·3 cites·20 claims
- 0792US10626500B2Showerhead designAPPLIED MATERIALS INC·Filed 2019·Granted Apr 21, 2020·7 cites·20 claims
- 0890US8133368B2Encapsulated sputtering targetHAWRYLCHAK LARA·Filed 2008·Granted Mar 13, 2012·14 cites·24 claims
- 0990US2024301584A1Method and apparatus for precleaning a substrate surface prior to epitaxial growthAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1089US11164737B2Integrated epitaxy and preclean systemAPPLIED MATERIALS INC·Filed 2018·Granted Nov 2, 2021·4 cites·20 claims
- 1189US2025385080A1Process chamber process kit with protective coatingAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1288US10770272B2Plasma-enhanced anneal chamber for wafer outgassingAPPLIED MATERIALS INC·Filed 2017·Granted Sep 8, 2020·5 cites·12 claims
- 1387US9508584B2In-situ removable electrostatic chuckAPPLIED MATERIALS INC·Filed 2014·Granted Nov 29, 2016·6 cites·20 claims
- 1487US8435392B2Encapsulated sputtering targetHAWRYLCHAK LARA·Filed 2012·Granted May 7, 2013·4 cites·20 claims
- 1586US11581408B2Method and apparatus for selective nitridation processAPPLIED MATERIALS INC·Filed 2021·Granted Feb 14, 2023·1 cites·17 claims
- 1686US10763090B2High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2016·Granted Sep 1, 2020·3 cites·19 claims
- 1786US9831091B2Plasma treating a process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Nov 28, 2017·4 cites·10 claims
- 1883USD790039SShowerhead for a semiconductor processing chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jun 20, 2017·25 cites·1 claims
- 1983US9514968B2Methods and apparatus for selective oxidation of a substrateAPPLIED MATERIALS INC·Filed 2015·Granted Dec 6, 2016·3 cites·11 claims
- 2082US11049719B2Epitaxy system integrated with high selectivity oxide removal and high temperature contaminant removalAPPLIED MATERIALS INC·Filed 2018·Granted Jun 29, 2021·3 cites·17 claims
- 2182US10221483B2Showerhead designAPPLIED MATERIALS INC·Filed 2015·Granted Mar 5, 2019·3 cites·11 claims
- 2282US9464349B2Adjustable process spacing, centering, and improved gas conductanceAPPLIED MATERIALS INC·Filed 2014·Granted Oct 11, 2016·3 cites·19 claims
- 2382US9096926B2Adjustable process spacing, centering, and improved gas conductanceAPPLIED MATERIALS INC·Filed 2013·Granted Aug 4, 2015·3 cites·17 claims
- 2481US11515130B2Fast response pedestal assembly for selective precleanAPPLIED MATERIALS INC·Filed 2018·Granted Nov 29, 2022·2 cites·20 claims
- 2581US10837122B2Method and apparatus for precleaning a substrate surface prior to epitaxial growthAPPLIED MATERIALS INC·Filed 2019·Granted Nov 17, 2020·0 cites·19 claims
- 2681US8668815B2Process kit for RF physical vapor depositionYOUNG DONNY·Filed 2012·Granted Mar 11, 2014·4 cites·10 claims
- 2780US10049881B2Method and apparatus for selective nitridation processROGERS MATTHEW S·Filed 2012·Granted Aug 14, 2018·4 cites·7 claims
- 2880US9773692B2In-situ removable electrostatic chuckAPPLIED MATERIALS INC·Filed 2016·Granted Sep 26, 2017·2 cites·20 claims
- 2979US2025046596A1Integrated epitaxy and preclean systemAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3077US10571337B2Thermal cooling member with low temperature controlAPPLIED MATERIALS INC·Filed 2017·Granted Feb 25, 2020·2 cites·12 claims
- 3177US2024282556A1Fast response pedestal assembly for selective precleanAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3276US11990321B2Fast response pedestal assembly for selective precleanAPPLIED MATERIALS INC·Filed 2022·Granted May 21, 2024·0 cites·20 claims
- 3375US12341032B2Methods of selective oxidation on rapid thermal processing (RTP) chamber with active steam generationAPPLIED MATERIALS INC·Filed 2024·Granted Jun 24, 2025·0 cites·13 claims
- 3475US9123511B2Process kit for RF physical vapor depositionYOUNG DONNY·Filed 2009·Granted Sep 1, 2015·3 cites·11 claims
- 3574US12487121B2Methods for calibrating an optical emission spectrometerAPPLIED MATERIALS INC·Filed 2024·Granted Dec 2, 2025·0 cites·20 claims
- 3674US11077410B2Gas injector with baffleAPPLIED MATERIALS INC·Filed 2018·Granted Aug 3, 2021·1 cites·19 claims
- 3774US10636650B2Argon addition to remote plasma oxidationAPPLIED MATERIALS INC·Filed 2018·Granted Apr 28, 2020·1 cites·10 claims
- 3874US9978569B2Adjustable process spacing, centering, and improved gas conductanceAPPLIED MATERIALS INC·Filed 2016·Granted May 22, 2018·1 cites·20 claims
- 3973US12125698B2Integrated epitaxy and preclean systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 22, 2024·0 cites·9 claims
- 4073US10428441B2Method and apparatus for precleaning a substrate surface prior to epitaxial growthAPPLIED MATERIALS INC·Filed 2017·Granted Oct 1, 2019·0 cites·14 claims
- 4173US10290504B2Plasma treating a process chamberAPPLIED MATERIALS INC·Filed 2017·Granted May 14, 2019·1 cites·16 claims
- 4273US9048190B2Methods and apparatus for processing substrates using an ion shieldAPPLIED MATERIALS INC·Filed 2013·Granted Jun 2, 2015·2 cites·14 claims
- 4373US2021010160A1Method and apparatus for precleaning a substrate surface prior to epitaxial growthAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 4473US2023245863A1Process chamber process kit with protective coatingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4573US2025385082A1Dual pressure oxidation method for forming an oxide layer in a featureAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4672US12272531B2Dual pressure oxidation method for forming an oxide layer in a featureAPPLIED MATERIALS INC·Filed 2022·Granted Apr 8, 2025·0 cites·20 claims
- 4771US11268193B2Gas injection apparatus with heating channelsAPPLIED MATERIALS INC·Filed 2020·Granted Mar 8, 2022·0 cites·13 claims
- 4870US10689757B2Gas injection apparatus with heating channelsAPPLIED MATERIALS INC·Filed 2017·Granted Jun 23, 2020·0 cites·20 claims
- 4968US11529592B2Gas injector with baffleAPPLIED MATERIALS INC·Filed 2021·Granted Dec 20, 2022·0 cites·20 claims
- 5068US2020357616A1High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
Showing the top 50 of 85 patent records by PatentIndex Score.
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