Inventor · disambiguated record
Hayato Namai
Also filed as: NAMAI HAYATO
23 granted patents·5 pending applications·38 citations·filing 2004–2022
92Inventor score
Top patents by PatentIndex Score
28 records- 0190US9477149B2Photoresist composition, compound, and production method thereofJSR CORP·Filed 2014·Granted Oct 25, 2016·6 cites·17 claims
- 0288US10824073B2Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2018·Granted Nov 3, 2020·3 cites·20 claims
- 0388US8734904B2Methods of forming topographical features using segregating polymer mixturesCHENG JOY·Filed 2010·Granted May 27, 2014·9 cites·36 claims
- 0487US9465291B2Radiation-sensitive resin composition, polymer, compound, and method for producing compoundJSR CORP·Filed 2014·Granted Oct 11, 2016·4 cites·17 claims
- 0586US9529259B2Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compoundJSR CORP·Filed 2015·Granted Dec 27, 2016·4 cites·15 claims
- 0679US9594303B2Resist pattern-forming method and photoresist compositionJSR CORP·Filed 2014·Granted Mar 14, 2017·4 cites·9 claims
- 0773US9412593B2Composition for film formation, resist underlayer film, and forming method of resist underlayer film, and pattern-forming methodJSR CORP·Filed 2015·Granted Aug 9, 2016·2 cites·17 claims
- 0870US9588423B2Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production methodJSR CORP·Filed 2014·Granted Mar 7, 2017·1 cites·14 claims
- 0970US8703395B2Pattern-forming methodNAMAI HAYATO·Filed 2011·Granted Apr 22, 2014·3 cites·14 claims
- 1067US9323146B2Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable baseJSR CORP·Filed 2014·Granted Apr 26, 2016·1 cites·18 claims
- 1165US10331031B2Resin composition, resist pattern-forming method and polymerJSR CORP·Filed 2017·Granted Jun 25, 2019·0 cites·12 claims
- 1262US9233840B2Method for improving self-assembled polymer featuresCHENG JOY·Filed 2010·Granted Jan 12, 2016·1 cites·22 claims
- 1357US9720322B2Photoresist composition, compound, and production method thereofJSR CORP·Filed 2016·Granted Aug 1, 2017·0 cites·14 claims
- 1456US11966161B2Radiation-sensitive resin composition, method of forming resist pattern, and compoundJSR CORP·Filed 2022·Granted Apr 23, 2024·0 cites·19 claims
- 1556US2016185999A1Resin composition, resist pattern-forming method and polymerJSR CORP·Filed 2016·Application pending·0 cites
- 1654US10088750B2Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production methodJSR CORP·Filed 2017·Granted Oct 2, 2018·0 cites·14 claims
- 1753US2009163743A1Luminescence system, method of luminescence, and chemical substance for luminescenceHOSHI YOUSUKE·Filed 2009·Application pending·0 cites
- 1846US11320739B2Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrateJSR CORP·Filed 2018·Granted May 3, 2022·0 cites·20 claims
- 1946US9557641B2Photoresist composition, resist pattern-forming method, acid diffusion control agent, and compoundJSR CORP·Filed 2014·Granted Jan 31, 2017·0 cites·18 claims
- 2045US9760004B2Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2014·Granted Sep 12, 2017·0 cites·12 claims
- 2145US2007138945A1Luminescence system, method of luminescence, and chemical substance for luminescenceHITACHI CHIEMICAL CO LTD·Filed 2004·Application pending·0 cites
- 2245US2010167024A1Negative-tone radiation-sensitive composition, cured pattern forming method, and cured patternJSR CORP·Filed 2009·Application pending·0 cites
- 2339US8968586B2Pattern-forming methodNAMAI HAYATO·Filed 2012·Granted Mar 3, 2015·0 cites·8 claims
- 2438US9126231B2Insulation pattern-forming method and insulation pattern-forming materialJSR CORP·Filed 2012·Granted Sep 8, 2015·0 cites·12 claims
- 2536US9874816B2Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2016·Granted Jan 23, 2018·0 cites·16 claims
- 2636US2016363859A1Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2016·Application pending·0 cites
- 2735US8883023B2Method for forming patternJSR CORP·Filed 2012·Granted Nov 11, 2014·0 cites·3 claims
- 2833US9703195B2Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compoundJSR CORP·Filed 2015·Granted Jul 11, 2017·0 cites·19 claims
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