Inventor · disambiguated record
Christof-Herbert Diener
Also filed as: DIENER CHRISTOF · DIENER CHRISTOF-HERBERT
8 granted patents·2 pending applications·13 citations·filing 2016–2021
78Inventor score
Top patents by PatentIndex Score
10 records- 0186US10041730B2Plasma vacuum system having a completely enclosed chamber extruded profileDIENER CHRISTOF HERBERT·Filed 2017·Granted Aug 7, 2018·7 cites·9 claims
- 0276US10024362B2Oleophilic bearing with surface-modified part made of stainless rolling bearing steelDIENER CHRISTOF·Filed 2017·Granted Jul 17, 2018·3 cites·10 claims
- 0375US11532465B2Low-pressure plasma chamber, low-pressure plasma installation and method for producing a low-pressure plasma chamberDIENER CHRISTOF HERBERT·Filed 2019·Granted Dec 20, 2022·2 cites·16 claims
- 0458US12162081B2Expandable vacuum chamber and method for producing an expandable vacuum chamberDIENER CHRISTOF HERBERT·Filed 2020·Granted Dec 10, 2024·0 cites·17 claims
- 0558US11459278B2Coating method for energetic material and coating system for coating energetic material using said type of coating methodDIENER CHRISTOF HERBERT·Filed 2020·Granted Oct 4, 2022·0 cites·9 claims
- 0651US2022152532A1Vacuum device having a sintered metal bag filterDIENER ELECTRONIC GMBH & CO KG·Filed 2021·Application pending·0 cites
- 0738US2016287735A1Plasma installation with a separately transportable vesselDIENER CHRISTOF-HERBERT·Filed 2016·Application pending·0 cites
- 0837US10580619B2Circuit assembly for providing high-frequency energy, and system for generating an electric dischargeDIENER CHRISTOF HERBERT·Filed 2017·Granted Mar 3, 2020·0 cites·21 claims
- 0933US9741547B2Low-pressure plasma system with sequential control processDIENER CHRISTOF-HERBERT·Filed 2016·Granted Aug 22, 2017·0 cites·15 claims
- 1030USD836212SVacuum deviceDIENER CHRISTOF HERBERT·Filed 2016·Granted Dec 18, 2018·1 cites·1 claims
Join the waitlist — get patent alerts
Get an alert when Christof-Herbert Diener files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →