Inventor · disambiguated record
Masaaki Miyagawa
Also filed as: MIYAGAWA MASAAKI
11 granted patents·7 pending applications·513 citations·filing 2003–2025
88Inventor score
Top patents by PatentIndex Score
18 records- 0196USD709536SFocusing ringYOSHIMURA AKIHIRO·Filed 2012·Granted Jul 22, 2014·455 cites·1 claims
- 0285US7658816B2Focus ring and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Feb 9, 2010·36 cites·8 claims
- 0381US11841278B2Temperature measurement sensor, temperature measurement system, and temperature measurement methodTOKYO ELECTRON LTD·Filed 2019·Granted Dec 12, 2023·2 cites·10 claims
- 0480US10290476B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted May 14, 2019·3 cites·15 claims
- 0576US8043472B2Substrate processing apparatus and focus ringTOKYO ELECTRON LTD·Filed 2008·Granted Oct 25, 2011·5 cites·3 claims
- 0675US8702903B2Thermally conductive sheet and substrate mounting device including sameMIYAGAWA MASAAKI·Filed 2008·Granted Apr 22, 2014·6 cites·15 claims
- 0774US8524005B2Heat-transfer structure and substrate processing apparatusMIYAGAWA MASAAKI·Filed 2007·Granted Sep 3, 2013·4 cites·10 claims
- 0865US7655579B2Method for improving heat transfer of a focus ring to a target substrate mounting deviceTOKYO ELECTRON LTD·Filed 2008·Granted Feb 2, 2010·2 cites·5 claims
- 0962US2025308864A1Substrate processing method, substrate processing apparatus, and substrate processing systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1054US11035741B2Temperature measurement substrate and temperature measurement systemTOKYO ELECTRON LTD·Filed 2017·Granted Jun 15, 2021·0 cites·15 claims
- 1149US2008236746A1Substrate processing apparatus and substrate mounting stage on which focus ring is mountedTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1248US2010012274A1Focus ring, substrate mounting table and plasma processing apparatus having sameTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1348US2021166960A1Jig, processing system and processing methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1444US9966291B2De-chuck control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted May 8, 2018·0 cites·6 claims
- 1544US2015162170A1Plasma processing apparatus and focus ringTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1639US10068778B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Sep 4, 2018·0 cites·16 claims
- 1738US2020343800A1Rotation apparatus and power generation systemSIMPLE TOKYO CO LTD·Filed 2020·Application pending·0 cites
- 1835US2004053186A1Heating apparatusFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →