Inventor · disambiguated record
John Foster
Also filed as: FOSTER JOHN · FOSTER JOHN C · FOSTER JOHN CLAYTON
21 granted patents·8 pending applications·557 citations·filing 1978–2022
96Inventor score
Files withADVANCED MICRO DEVICES INC16ROCHE SEQUENCING SOLUTIONS INC3CONDON DOLORES1FOSTER JOHN C1GENIA TECH INC1
Top patents by PatentIndex Score
29 records- 0196US6475874B2Damascene NiSi metal gate high-k transistorADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 5, 2002·137 cites·14 claims
- 0295US6562718B1Process for forming fully silicided gatesADVANCED MICRO DEVICES INC·Filed 2000·Granted May 13, 2003·107 cites·18 claims
- 0391US6465309B1Silicide gate transistorsADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 15, 2002·57 cites·14 claims
- 0490US9322062B2Process for biosensor well formationGENIA TECHNOLOGIES INC·Filed 2014·Granted Apr 26, 2016·7 cites·11 claims
- 0589US6602781B1Metal silicide gate transistorsADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 5, 2003·52 cites·27 claims
- 0687US6368950B1Silicide gate transistorsADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 9, 2002·41 cites·24 claims
- 0785US6387804B1Passivation of sidewall spacers using ozonated waterADVANCED MICRO DEVICES INC·Filed 2000·Granted May 14, 2002·32 cites·12 claims
- 0881US10273536B2Process for biosensor well formationGENIA TECH INC·Filed 2016·Granted Apr 30, 2019·1 cites·13 claims
- 0978US6342414B1Damascene NiSi metal gate high-k transistorADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 29, 2002·24 cites·18 claims
- 1074US7498222B1Enhanced etching of a high dielectric constant layerADVANCED MICRO DEVICES INC·Filed 2006·Granted Mar 3, 2009·6 cites·15 claims
- 1171US6605513B2Method of forming nickel silicide using a one-step rapid thermal anneal process and backend processingADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 12, 2003·16 cites·10 claims
- 1271US6372644B1Hydrogen passivated silicon nitride spacers for reduced nickel silicide bridgingADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 16, 2002·16 cites·14 claims
- 1365US4938535AAdjustable shoulder/lap seat belt adapterCONDON DOLORES·Filed 1989·Granted Jul 3, 1990·35 cites·2 claims
- 1464US8703620B2Methods for PFET fabrication using APM solutionsWASYLUK JOANNA·Filed 2012·Granted Apr 22, 2014·2 cites·10 claims
- 1564US2021041392A1Nanopore well structures and methodsROCHE SEQUENCING SOLUTIONS INC·Filed 2020·Application pending·0 cites
- 1663US6784506B2Silicide process using high K-dielectricsADVANCED MICRO DEVICES INC·Filed 2001·Granted Aug 31, 2004·10 cites·2 claims
- 1762US10739299B2Nanopore well structures and methodsROCHE SEQUENCING SOLUTIONS INC·Filed 2018·Granted Aug 11, 2020·0 cites·8 claims
- 1859US2023100579A1Nanopore cell with seamless working electrode and methods of forming the sameROCHE SEQUENCING SOLUTIONS INC·Filed 2022·Application pending·0 cites
- 1957US2013332268A1Selective customer interactions over a computer networkFOSTER JOHN C·Filed 2013·Application pending·0 cites
- 2054US6764912B1Passivation of nitride spacerADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 20, 2004·6 cites·11 claims
- 2154US6458679B1Method of making silicide stop layer in a damascene semiconductor structureADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 1, 2002·5 cites·9 claims
- 2248US6368963B1Passivation of semiconductor device surfaces using an iodine/ethanol solutionADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 9, 2002·3 cites·13 claims
- 2347US9524142B2System and method for providing, gesture control of audio informationHONEYWELL INT INC·Filed 2014·Granted Dec 20, 2016·0 cites·17 claims
- 2447US2010306249A1Social network systems and methodsHILL JAMES·Filed 2010·Application pending·0 cites
- 2544US2010203968A1Apparatus And Method Of Avatar CustomisationSONY COMP ENTERTAINMENT EUROPE·Filed 2008·Application pending·0 cites
- 2644US2012001033A1Equipment mounting apparatus and methodWILDE GARY P·Filed 2010·Application pending·0 cites
- 2738US2003034533A1Silicide stop layer in a damascene semiconductor structureADVANCED MICRO DEVICES INC·Filed 2002·Application pending·0 cites
- 2832US2002111021A1Ozone oxide as a mediating layer in nickel silicide formationADVANCED MICRO DEVICES INC·Filed 2001·Application pending·0 cites
- 2930US4155136ASound deadening in ultrasonic heel attacherUSM CORP·Filed 1978·Granted May 22, 1979·0 cites·6 claims
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