Inventor · disambiguated record
Karen E. Petrillo
Also filed as: PETRILLO KAREN · PETRILLO KAREN E · PETRILLO KAREN ELIZABETH
32 granted patents·1 pending application·314 citations·filing 1995–2023
97Inventor score
Top patents by PatentIndex Score
33 records- 0187US10254652B2Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterningIBM·Filed 2018·Granted Apr 9, 2019·3 cites·20 claims
- 0286US7709177B2Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereofIBM·Filed 2007·Granted May 4, 2010·7 cites·18 claims
- 0385US10082736B2Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterningIBM·Filed 2017·Granted Sep 25, 2018·3 cites·20 claims
- 0484US10545409B1Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delayIBM·Filed 2019·Granted Jan 28, 2020·3 cites·17 claims
- 0584US6043003AE-beam application to mask making using new improved KRS resist systemIBM·Filed 1999·Granted Mar 28, 2000·45 cites·19 claims
- 0681US8202460B2Microelectronic substrate having removable edge extension elementKOBURGER III CHARLES W·Filed 2005·Granted Jun 19, 2012·5 cites·9 claims
- 0779US6037097AE-beam application to mask making using new improved KRS resist systemIBM·Filed 1998·Granted Mar 14, 2000·50 cites·35 claims
- 0878US6221568B1Developers for polychloroacrylate and polychloromethacrylate based resistsIBM·Filed 1999·Granted Apr 24, 2001·37 cites·32 claims
- 0976US6543617B2Packaged radiation sensitive coated workpiece process for making and method of storing sameIBM·Filed 2001·Granted Apr 8, 2003·16 cites·49 claims
- 1073US6436605B1Plasma resistant composition and use thereofIBM·Filed 1999·Granted Aug 20, 2002·31 cites·25 claims
- 1172US10514605B2Resist multilayer film-attached substrate and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Dec 24, 2019·1 cites·20 claims
- 1267US6251569B1Forming a pattern of a negative photoresistIBM·Filed 1999·Granted Jun 26, 2001·23 cites·25 claims
- 1363US9580623B2Patterning process using a boron phosphorus silicon glass filmSHINETSU CHEMICAL CO·Filed 2015·Granted Feb 28, 2017·1 cites·12 claims
- 1461US11688636B2Spin on scaffold film for forming topviaIBM·Filed 2021·Granted Jun 27, 2023·0 cites·20 claims
- 1561US11067896B2Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delayIBM·Filed 2019·Granted Jul 20, 2021·0 cites·20 claims
- 1661US7807335B2Immersion lithography contamination gettering layerIBM·Filed 2005·Granted Oct 5, 2010·1 cites·22 claims
- 1760US6617086B2Forming a pattern of a negative photoresistIBM·Filed 2001·Granted Sep 9, 2003·5 cites·21 claims
- 1860US6586156B2Etch improved resist systems containing acrylate (or methacrylate) silane monomersIBM·Filed 2001·Granted Jul 1, 2003·6 cites·23 claims
- 1960US5593812APhotoresist having increased sensitivity and use thereofIBM·Filed 1995·Granted Jan 14, 1997·18 cites·18 claims
- 2058US11022891B2Photoresist bridging defect removal by reverse tone weak developerIBM·Filed 2017·Granted Jun 1, 2021·0 cites·2 claims
- 2158US7361444B1Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereofIBM·Filed 1999·Granted Apr 22, 2008·22 cites·6 claims
- 2257US7638266B2Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layerIBM·Filed 2004·Granted Dec 29, 2009·4 cites·23 claims
- 2357US7168224B2Method of making a packaged radiation sensitive resist film-coated workpieceIBM·Filed 2002·Granted Jan 30, 2007·4 cites·91 claims
- 2456US11022890B2Photoresist bridging defect removal by reverse tone weak developerIBM·Filed 2017·Granted Jun 1, 2021·0 cites·6 claims
- 2555US8946866B2Microelectronic substrate having removable edge extension elementKOBURGER III CHARLES W·Filed 2012·Granted Feb 3, 2015·0 cites·20 claims
- 2655US2025201559A1Semiconductor pattern structure preservationIBM·Filed 2023·Application pending·0 cites
- 2753US7736833B2Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereofIBM·Filed 2007·Granted Jun 15, 2010·3 cites·17 claims
- 2850US5753412APhotoresist having increased sensitivity and use thereofIBM·Filed 1996·Granted May 19, 1998·11 cites·31 claims
- 2948US7314700B2High sensitivity resist compositions for electron-based lithographyIBM·Filed 2002·Granted Jan 1, 2008·1 cites·14 claims
- 3047US5770345APhotoresist having increased sensitivity and use thereofIBM·Filed 1996·Granted Jun 23, 1998·9 cites·15 claims
- 3143US12087601B2Reducing line edge roughness and mitigating defects by wafer freezingIBM·Filed 2019·Granted Sep 10, 2024·0 cites·3 claims
- 3239US7960095B2Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substratesIBM·Filed 2004·Granted Jun 14, 2011·0 cites·5 claims
- 3339US5908732APolymer compositions for high resolution resist applicationsIBM·Filed 1996·Granted Jun 1, 1999·5 cites·40 claims
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