Inventor · disambiguated record
Derrick Shaughnessy
Also filed as: SHAUGHNESSY DERRICK · SHAUGHNESSY DERRICK A
16 granted patents·3 pending applications·76 citations·filing 2004–2024
90Inventor score
Top patents by PatentIndex Score
19 records- 0196US8860937B1Metrology systems and methods for high aspect ratio and large lateral dimension structuresKLA TENCOR CORP·Filed 2013·Granted Oct 14, 2014·35 cites·19 claims
- 0293US10006865B1Confined illumination for small spot size metrologyKLA TENCOR CORP·Filed 2017·Granted Jun 26, 2018·8 cites·15 claims
- 0391US10203247B2Systems for providing illumination in optical metrologyKLA TENCOR CORP·Filed 2016·Granted Feb 12, 2019·10 cites·21 claims
- 0488US9400246B2Optical metrology tool equipped with modulated illumination sourcesKLA TENCOR CORP·Filed 2012·Granted Jul 26, 2016·5 cites·24 claims
- 0574US9719932B1Confined illumination for small spot size metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 1, 2017·2 cites·11 claims
- 0673US11913874B2Optical metrology tool equipped with modulated illumination sourcesKLA CORP·Filed 2021·Granted Feb 27, 2024·0 cites·12 claims
- 0770US7045786B2Method of photocarrier radiometry of semiconductorsMANDELIS ANDREAS·Filed 2004·Granted May 16, 2006·12 cites·70 claims
- 0869US9512985B2Systems for providing illumination in optical metrologyKLA TENCOR CORP·Filed 2013·Granted Dec 6, 2016·2 cites·50 claims
- 0964US10215688B2Optical metrology tool equipped with modulated illumination sourcesKLA TENCOR CORP·Filed 2016·Granted Feb 26, 2019·0 cites·19 claims
- 1063US10969328B2Optical metrology tool equipped with modulated illumination sourcesKLA TENCOR CORP·Filed 2019·Granted Apr 6, 2021·0 cites·10 claims
- 1160US8111399B2System and method for performing photothermal measurements and relaxation compensationROTTER LAWRENCE D·Filed 2009·Granted Feb 7, 2012·1 cites·20 claims
- 1260US2024151770A1Methods And Systems For Measurement Of Semiconductor Structures Based On Derivative Measurement SignalsKLA CORP·Filed 2023·Application pending·0 cites
- 1360US2025147434A1Metrology in the Presence of CMOS Under Array (CUA) Structures Utilizing Model-Less Machine LearningKLA CORP·Filed 2023·Application pending·0 cites
- 1458US2025224344A1Measurements Of Semiconductor Structures Based On Data Collected At Prior Process StepsKLA CORP·Filed 2024·Application pending·0 cites
- 1555US12380367B2Metrology in the presence of CMOS under array (CuA) structures utilizing machine learning and physical modelingKLA CORP·Filed 2023·Granted Aug 5, 2025·0 cites·22 claims
- 1655US12372882B2Metrology in the presence of CMOS under array (CUA) structures utilizing an effective medium model with classification of CUA structuresKLA CORP·Filed 2023·Granted Jul 29, 2025·0 cites·36 claims
- 1754US12510590B2Metrology in the presence of CMOS under array (CuA) structures utilizing an effective medium model with physical modelingKLA CORP·Filed 2023·Granted Dec 30, 2025·0 cites·35 claims
- 1846US8804106B2System and method for nondestructively measuring concentration and thickness of doped semiconductor layersZHU NANCHANG·Filed 2012·Granted Aug 12, 2014·1 cites·23 claims
- 1941US10804167B2Methods and systems for co-located metrologyKLA TENCOR CORP·Filed 2019·Granted Oct 13, 2020·0 cites·63 claims
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