Inventor · disambiguated record
Raihan M. Tarafdar
Also filed as: TARAFDAR RAIHAN · TARAFDAR RAIHAN M
14 granted patents·1 pending application·2,216 citations·filing 2002–2021
95Inventor score
Top patents by PatentIndex Score
15 records- 0198US7790633B1Sequential deposition/anneal film densification methodNOVELLUS SYSTEMS INC·Filed 2006·Granted Sep 7, 2010·643 cites·23 claims
- 0298US7482247B1Conformal nanolaminate dielectric deposition and etch bag gap fill processNOVELLUS SYSTEMS INC·Filed 2006·Granted Jan 27, 2009·583 cites·27 claims
- 0398US7148155B1Sequential deposition/anneal film densification methodNOVELLUS SYSTEMS INC·Filed 2004·Granted Dec 12, 2006·416 cites·34 claims
- 0498US6846745B1High-density plasma process for filling high aspect ratio structuresNOVELLUS SYSTEMS INC·Filed 2002·Granted Jan 25, 2005·311 cites·28 claims
- 0597US9748137B2Method for void-free cobalt gap fillLAM RES CORP·Filed 2015·Granted Aug 29, 2017·26 cites·18 claims
- 0693US7297608B1Method for controlling properties of conformal silica nanolaminates formed by rapid vapor depositionNOVELLUS SYSTEMS INC·Filed 2004·Granted Nov 20, 2007·68 cites·32 claims
- 0790US7202185B1Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layerNOVELLUS SYSTEMS INC·Filed 2004·Granted Apr 10, 2007·48 cites·37 claims
- 0889US7097878B1Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 filmsNOVELLUS SYSTEMS INC·Filed 2004·Granted Aug 29, 2006·35 cites·19 claims
- 0986US10229826B2Systems and methods for forming low resistivity metal contacts and interconnects by reducing and removing metallic oxideLAM RES CORP·Filed 2017·Granted Mar 12, 2019·4 cites·19 claims
- 1082US7129189B1Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD)NOVELLUS SYSTEMS INC·Filed 2004·Granted Oct 31, 2006·26 cites·26 claims
- 1181US7271112B1Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometryNOVELLUS SYSTEMS INC·Filed 2004·Granted Sep 18, 2007·25 cites·17 claims
- 1277US7294583B1Methods for the use of alkoxysilanol precursors for vapor deposition of SiO2 filmsNOVELLUS SYSTEMS INC·Filed 2004·Granted Nov 13, 2007·18 cites·23 claims
- 1371US7223707B1Dynamic rapid vapor deposition process for conformal silica laminatesNOVELLUS SYSTEMS INC·Filed 2004·Granted May 29, 2007·10 cites·36 claims
- 1470US7678709B1Method of forming low-temperature conformal dielectric filmsNOVELLUS SYSTEMS INC·Filed 2007·Granted Mar 16, 2010·3 cites·19 claims
- 1549US2023326790A1Low resistivity contacts and interconnectsLAM RES CORP·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →