Inventor · disambiguated record
Craig P. Meuchel
Also filed as: MEUCHEL CRAIG · MEUCHEL CRAIG P
11 granted patents·2 pending applications·497 citations·filing 1995–2007
93Inventor score
Technology areasH10P
Top patents by PatentIndex Score
13 records- 0196US6286231B1Method and apparatus for high-pressure wafer processing and dryingSEMITOOL INC·Filed 2000·Granted Sep 11, 2001·178 cites·56 claims
- 0290US6357142B1Method and apparatus for high-pressure wafer processing and dryingSEMITOOL INC·Filed 2001·Granted Mar 19, 2002·43 cites·53 claims
- 0390US5658387ASemiconductor processing spray coating apparatusSEMITOOL INC·Filed 1995·Granted Aug 19, 1997·108 cites·24 claims
- 0487US7138016B2Semiconductor processing apparatusSEMITOOL INC·Filed 2001·Granted Nov 21, 2006·31 cites·109 claims
- 0583US6745494B2Method and apparatus for processing wafers under pressureSEMITOOL INC·Filed 2002·Granted Jun 8, 2004·21 cites·21 claims
- 0682US6488038B1Method for cleaning semiconductor substratesSEMITOOL INC·Filed 2000·Granted Dec 3, 2002·27 cites·12 claims
- 0782US6375741B2Semiconductor processing spray coating apparatusFiled 2000·Granted Apr 23, 2002·23 cites·50 claims
- 0877US6543156B2Method and apparatus for high-pressure wafer processing and dryingSEMITOOL INC·Filed 2002·Granted Apr 8, 2003·14 cites·49 claims
- 0969US7305999B2Centrifugal spray processor and retrofit kitSEMITOOL INC·Filed 2002·Granted Dec 11, 2007·13 cites·24 claims
- 1069US6066575ASemiconductor processing spray coating apparatusSEMITOOL INC·Filed 1997·Granted May 23, 2000·34 cites·28 claims
- 1160US7094291B2Semiconductor processing apparatusSEMITOOL INC·Filed 2001·Granted Aug 22, 2006·5 cites·54 claims
- 1245US2008083427A1Post etch residue removal from substratesSEMITOOL INC·Filed 2007·Application pending·0 cites
- 1334US2007193607A1Methods and apparatus for cleaning edges of a substrateGHEKIERE JOHN·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →