Inventor · disambiguated record
Hiroshi Masusaki
Also filed as: MASUSAKI HIROSHI
10 granted patents·179 citations·filing 1995–2003
90Inventor score
Top patents by PatentIndex Score
10 records- 0185US6483589B1Laser spectroscopy systemNIPPON OXYGEN CO LTD·Filed 2000·Granted Nov 19, 2002·33 cites·2 claims
- 0282US7033843B2Semiconductor manufacturing method and semiconductor manufacturing apparatusMITSUBISHI MATERIAL SILICON·Filed 2003·Granted Apr 25, 2006·22 cites·8 claims
- 0373US6491758B1CVD apparatus equipped with moisture monitoringMITSUBISHI MATERIAL SILICON·Filed 2000·Granted Dec 10, 2002·11 cites·9 claims
- 0471US5821537AInfrared spectroscopic analysis method for gases and device employing the method thereinNIPPON OXYGEN CO LTD·Filed 1997·Granted Oct 13, 1998·33 cites·12 claims
- 0565US6800855B1Spectroscopic method for analyzing isotopes by using a semiconductor laserNIPPON OXYGEN CO LTD·Filed 1999·Granted Oct 5, 2004·29 cites·5 claims
- 0661US5703365AInfrared spectroscopic analysis method for gases and device employing the method thereinNIPPON OXYGEN CO LTD·Filed 1995·Granted Dec 30, 1997·23 cites·19 claims
- 0760US6636316B1Spectroscopic method for analyzing a gas by using laser beamNIPPON OXYGEN CO LTD·Filed 1999·Granted Oct 21, 2003·24 cites·9 claims
- 0855US6887721B2Method of purging CVD apparatus and method for judging maintenance of times of semiconductor production apparatusesTAIYO NIPPON SANSO CORP·Filed 2001·Granted May 3, 2005·2 cites·6 claims
- 0951US6776805B2Semiconductor manufacturing apparatus having a moisture measuring deviceMITSUBISHI MATERIAL SILICON·Filed 2001·Granted Aug 17, 2004·2 cites·16 claims
- 1042US6794204B2Semiconductor manufacturing method and semiconductor manufacturing apparatusMITSUBISHI MATERIAL SILICON·Filed 2002·Granted Sep 21, 2004·0 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →