Inventor · disambiguated record
Seiki Ishida
Also filed as: ISHIDA SEIKI
13 granted patents·2 pending applications·132 citations·filing 2001–2016
91Inventor score
Top patents by PatentIndex Score
15 records- 0193US8443513B2Substrate processing apparatusISHIDA SEIKI·Filed 2010·Granted May 21, 2013·28 cites·11 claims
- 0290US8154106B2Coating and developing system and coating and developing methodISHIDA SEIKI·Filed 2006·Granted Apr 10, 2012·17 cites·6 claims
- 0390US7563042B2Substrate carrying apparatus, substrate carrying method, and coating and developing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Jul 21, 2009·16 cites·13 claims
- 0485US10553421B2Substrate processing apparatus, substrate processing method and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Feb 4, 2020·6 cites·26 claims
- 0585US8033244B2Substrate processing systemTOKYO ELECTRON LTD·Filed 2008·Granted Oct 11, 2011·12 cites·16 claims
- 0685US7809460B2Coating and developing apparatus, coating and developing method and storage medium in which a computer-readable program is storedTOKYO ELECTRON LTD·Filed 2006·Granted Oct 5, 2010·11 cites·15 claims
- 0775US8303232B2Substrate processing systemISHIDA SEIKI·Filed 2009·Granted Nov 6, 2012·5 cites·9 claims
- 0875US7284917B2Coating and developing system and coating and developing methodTOKYO ELECTRON LTD·Filed 2006·Granted Oct 23, 2007·5 cites·21 claims
- 0974US6579370B2Apparatus and method for coating treatmentTOKYO ELECTRON LTD·Filed 2001·Granted Jun 17, 2003·17 cites·17 claims
- 1070US9052610B2Coating and developing system and coating and developing methodISHIDA SEIKI·Filed 2012·Granted Jun 9, 2015·2 cites·8 claims
- 1165US9889476B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Feb 13, 2018·1 cites·10 claims
- 1265US6620245B2Liquid coating apparatus with temperature controlling manifoldTOKYO ELECTRON LTD·Filed 2001·Granted Sep 16, 2003·12 cites·14 claims
- 1348US2010108095A1Substrate processing apparatus and substrate cleaning methodTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1447US2008130226A1Centrifugal fan device and electronic apparatus having the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2007·Application pending·0 cites
- 1534US10290518B2Substrate liquid processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted May 14, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →