Assignee
WANG CHIEN-WEI
TW·11 granted patents·1 pending application·273 citations·filing 2008–2012
Top patents by PatentIndex Score
12 records- 0199US8216767B2Patterning process and chemical amplified photoresist with a photodegradable baseWANG CHIEN-WEI·Filed 2009·Granted Jul 10, 2012·110 cites·19 claims
- 0298US8658344B2Patterning process and photoresist with a photodegradable baseWANG CHIEN-WEI·Filed 2012·Granted Feb 25, 2014·93 cites·19 claims
- 0397US8586290B2Patterning process and chemical amplified photoresist compositionWANG CHIEN-WEI·Filed 2009·Granted Nov 19, 2013·34 cites·21 claims
- 0491US8563231B2Patterning process and materials for lithographyWANG CHIEN-WEI·Filed 2011·Granted Oct 22, 2013·10 cites·22 claims
- 0590US8512939B2Photoresist stripping techniqueWANG CHIEN-WEI·Filed 2009·Granted Aug 20, 2013·13 cites·14 claims
- 0686US8105954B2System and method of vapor depositionWANG CHIEN-WEI·Filed 2008·Granted Jan 31, 2012·8 cites·19 claims
- 0773US9029062B2Photoresist and patterning processWANG CHIEN-WEI·Filed 2010·Granted May 12, 2015·2 cites·20 claims
- 0872US9046785B2Method and apparatus of patterning a semiconductor deviceWANG CHIEN-WEI·Filed 2009·Granted Jun 2, 2015·2 cites·19 claims
- 0963US8956806B2Photoresist and patterning processWANG CHIEN-WEI·Filed 2009·Granted Feb 17, 2015·1 cites·20 claims
- 1051US8822347B2Wet soluble lithographyWANG CHIEN-WEI·Filed 2009·Granted Sep 2, 2014·0 cites·20 claims
- 1151US8304179B2Method for manufacturing a semiconductor device using a modified photosensitive layerWANG CHIEN-WEI·Filed 2009·Granted Nov 6, 2012·0 cites·17 claims
- 1249US2012090547A1System and method of vapor depositionWANG CHIEN-WEI·Filed 2011·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →