Assignee
VLSI STANDARDS INC
US·11 granted patents·387 citations·filing 1987–2000
Top patents by PatentIndex Score
11 records- 0183US6358860B1Line width calibration standard manufacturing and certifying methodVLSI STANDARDS INC·Filed 2000·Granted Mar 19, 2002·30 cites·44 claims
- 0283US5194297ASystem and method for accurately depositing particles on a surfaceVLSI STANDARDS INC·Filed 1992·Granted Mar 16, 1993·77 cites·14 claims
- 0382US4725294AApparatus for collection of particulate matter from an ambient gasVLSI STANDARDS INC·Filed 1987·Granted Feb 16, 1988·47 cites·13 claims
- 0478US5955654ACalibration standard for microroughness measuring instrumentsVLSI STANDARDS INC·Filed 1997·Granted Sep 21, 1999·45 cites·6 claims
- 0574US5599464AFormation of atomic scale vertical features for topographic instrument calibrationVLSI STANDARDS INC·Filed 1995·Granted Feb 4, 1997·38 cites·24 claims
- 0671US6016684ACertification of an atomic-level step-height standard and instrument calibration with such standardsVLSI STANDARDS INC·Filed 1998·Granted Jan 25, 2000·56 cites·11 claims
- 0764US5659388AMethod and apparatus for operating a condensation nucleus counter with improved counting stability and accuracy over a variable detection thresholdVLSI STANDARDS INC·Filed 1996·Granted Aug 19, 1997·31 cites·15 claims
- 0855US5198869AReference wafer for haze calibrationVLSI STANDARDS INC·Filed 1990·Granted Mar 30, 1993·31 cites·19 claims
- 0945US5078492ATest wafer for an optical scannerVLSI STANDARDS INC·Filed 1991·Granted Jan 7, 1992·15 cites·10 claims
- 1042US5677765AMethod for calibrating a topographic instrumentVLSI STANDARDS INC·Filed 1996·Granted Oct 14, 1997·10 cites·15 claims
- 1129US5453830ASpatially isolated diffractor on a calibration substrate for a pellicle inspection systemVLSI STANDARDS INC·Filed 1994·Granted Sep 26, 1995·7 cites·16 claims
Join the waitlist — get patent alerts
Get an alert when VLSI STANDARDS INC files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →