Assignee
SEMICONDUCTOR PROCESS LAB CO
JP·19 granted patents·1 pending application·762 citations·filing 1990–2006
Top patents by PatentIndex Score
20 records- 0196US6514884B2Method for reforming base surface, method for manufacturing semiconductor device and equipment for manufacturing the sameSEMICONDUCTOR PROCESS LAB CO·Filed 1998·Granted Feb 4, 2003·220 cites·10 claims
- 0286US5858100ASubstrate holder and reaction apparatusSEMICONDUCTOR PROCESS LAB CO·Filed 1995·Granted Jan 12, 1999·82 cites·16 claims
- 0385US5302209AApparatus for manufacturing semiconductor deviceSEMICONDUCTOR PROCESS LAB CO·Filed 1992·Granted Apr 12, 1994·97 cites·8 claims
- 0483US5769942AMethod for epitaxial growthSEMICONDUCTOR PROCESS LAB CO·Filed 1995·Granted Jun 23, 1998·39 cites·14 claims
- 0582US6110290AMethod for epitaxial growth and apparatus for epitaxial growthSEMICONDUCTOR PROCESS LAB CO·Filed 1998·Granted Aug 29, 2000·35 cites·5 claims
- 0671US6133160AMethod for reforming undercoating surface and method for production of semiconductor deviceSEMICONDUCTOR PROCESS LAB CO·Filed 1998·Granted Oct 17, 2000·40 cites·20 claims
- 0770US5051380AProcess for producing semiconductor deviceSEMICONDUCTOR PROCESS LAB CO·Filed 1990·Granted Sep 24, 1991·45 cites·2 claims
- 0869US5376591AMethod for manufacturing semiconductor deviceSEMICONDUCTOR PROCESS LAB CO·Filed 1992·Granted Dec 27, 1994·44 cites·18 claims
- 0969US5281295ASemiconductor fabrication equipmentSEMICONDUCTOR PROCESS LAB CO·Filed 1992·Granted Jan 25, 1994·47 cites·5 claims
- 1060US5679165AApparatus for manufacturing semiconductor deviceSEMICONDUCTOR PROCESS LAB CO·Filed 1995·Granted Oct 21, 1997·26 cites·8 claims
- 1159US5231058AProcess for forming cvd film and semiconductor deviceSEMICONDUCTOR PROCESS LAB CO·Filed 1990·Granted Jul 27, 1993·30 cites·2 claims
- 1258US6900144B2Film-forming surface reforming method and semiconductor device manufacturing methodSEMICONDUCTOR PROCESS LAB CO·Filed 2001·Granted May 31, 2005·6 cites·14 claims
- 1357US6352943B2Method of film formation and method for manufacturing semiconductor deviceSEMICONDUCTOR PROCESS LAB CO·Filed 1998·Granted Mar 5, 2002·21 cites·22 claims
- 1454US7238629B2Deposition method, method of manufacturing semiconductor device, and semiconductor deviceSEMICONDUCTOR PROCESS LAB CO·Filed 2004·Granted Jul 3, 2007·4 cites·11 claims
- 1554US6911405B2Semiconductor device and method of manufacturing the sameSEMICONDUCTOR PROCESS LAB CO·Filed 2001·Granted Jun 28, 2005·4 cites·18 claims
- 1651US7132171B2Low dielectric constant insulating film and method of forming the sameSEMICONDUCTOR PROCESS LAB CO·Filed 2004·Granted Nov 7, 2006·5 cites·13 claims
- 1744US7329612B2Semiconductor device and process for producing the sameSEMICONDUCTOR PROCESS LAB CO·Filed 2003·Granted Feb 12, 2008·0 cites·17 claims
- 1842US5569499AMethod for reforming insulating filmSEMICONDUCTOR PROCESS LAB CO·Filed 1994·Granted Oct 29, 1996·11 cites·10 claims
- 1942US2006251825A1Low dielectric constant insulating film and method of forming the sameSEMICONDUCTOR PROCESS LAB CO·Filed 2006·Application pending·0 cites
- 2032US6207537B1Method for formation of impurity region in semiconductor layer and apparatus for introducing impurity to semiconductor layerSEMICONDUCTOR PROCESS LAB CO·Filed 1999·Granted Mar 27, 2001·6 cites·7 claims
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