Assignee
S&S TECH CO LTD
KR·20 granted patents·15 pending applications·34 citations·filing 2012–2025
Top patents by PatentIndex Score
35 records- 0192US10768523B2Pellicle for EUV lithography and method of fabricating the sameS&S TECH CO LTD·Filed 2018·Granted Sep 8, 2020·7 cites·40 claims
- 0291US9256119B2Phase-shift blankmask and method for fabricating the sameS&S TECH CO LTD·Filed 2013·Granted Feb 9, 2016·11 cites·14 claims
- 0389US10859901B2Pellicle for EUV lithography and method of fabricating the sameS&S TECH CO LTD·Filed 2018·Granted Dec 8, 2020·10 cites·19 claims
- 0484US11940725B2Phase shift blankmask and photomask for EUV lithographyS&S TECH CO LTD·Filed 2021·Granted Mar 26, 2024·1 cites·34 claims
- 0579US9851632B2Phase-shift blankmask and photomaskS&S TECH CO LTD·Filed 2015·Granted Dec 26, 2017·2 cites·17 claims
- 0679US9229317B2Blankmask and method for fabricating photomask using the sameS&S TECH CO LTD·Filed 2013·Granted Jan 5, 2016·3 cites·17 claims
- 0778US2026023318A1Pellicle frame and pellicle assembly with the sameS&S TECH CO LTD·Filed 2025·Application pending·0 cites
- 0867US12541144B2Phase shift blankmask and photomask for EUV lithographyS&S TECH CO LTD·Filed 2022·Granted Feb 3, 2026·0 cites·11 claims
- 0966US2025231476A1Frame assembly used for mounting pellicle on photomaskS&S TECH CO LTD·Filed 2024·Application pending·0 cites
- 1065US11579521B2Reflective type blankmask and photomask for EUVS&S TECH CO LTD·Filed 2021·Granted Feb 14, 2023·0 cites·19 claims
- 1163US11360377B2Half-tone attenuated phase shift blankmask and photomask for EUV lithographyS&S TECH CO LTD·Filed 2020·Granted Jun 14, 2022·0 cites·13 claims
- 1262US11467485B2Blankmask and photomask for extreme ultraviolet lithographyS&S TECH CO LTD·Filed 2020·Granted Oct 11, 2022·0 cites·26 claims
- 1362US2025231473A1Reverse photomask that phase shift film pattern is used for reflective pattern, and blankmask for manufacturing the sameS&S TECH CO LTD·Filed 2024·Application pending·0 cites
- 1461US11927880B2Phase shift blankmask and photomask for EUV lithographyS&S TECH CO LTD·Filed 2022·Granted Mar 12, 2024·0 cites·38 claims
- 1561US2025123551A1PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY WITH ABSORBING FILM OF CrSbS&S TECH CO LTD·Filed 2024·Application pending·0 cites
- 1658US11815801B2Reflective type blankmask and photomask for EUVS&S TECH CO LTD·Filed 2021·Granted Nov 14, 2023·0 cites·18 claims
- 1758US11435661B2Reflective type blankmask for EUV, and method for manufacturing the sameS&S TECH CO LTD·Filed 2020·Granted Sep 6, 2022·0 cites·18 claims
- 1858US10942445B2Blankmask and photomask, and methods of fabricating the sameS&S TECH CO LTD·Filed 2018·Granted Mar 9, 2021·0 cites·7 claims
- 1958US2024329516A1Phase shift blankmask and photomask for euv lithographyS&S TECH CO LTD·Filed 2023·Application pending·0 cites
- 2058US2024036461A1Pellicle for euv lithographyS&S TECH CO LTD·Filed 2023·Application pending·0 cites
- 2157US2024329515A1Blankmask for euv lithography with absorbing film, and photomask fabricated with the sameS&S TECH CO LTD·Filed 2023·Application pending·0 cites
- 2255US2024126163A1Phase shift blankmask and photomask for euv lithographyS&S TECH CO LTD·Filed 2023·Application pending·0 cites
- 2354US9482940B2Blankmask and photomaskS&S TECH CO LTD·Filed 2014·Granted Nov 1, 2016·0 cites·12 claims
- 2452US8846276B2Blankmask and photomask using the sameS&S TECH CO LTD·Filed 2012·Granted Sep 30, 2014·0 cites·20 claims
- 2549US9389500B2Mask blank, photomask, and method for manufacturing sameS&S TECH CO LTD·Filed 2012·Granted Jul 12, 2016·0 cites·13 claims
- 2648US10036947B2Blankmask and photomask using the sameS&S TECH CO LTD·Filed 2015·Granted Jul 31, 2018·0 cites·29 claims
- 2745US9551925B2Blankmask and photomask using the sameS&S TECH CO LTD·Filed 2015·Granted Jan 24, 2017·0 cites·13 claims
- 2844US10018905B2Phase shift blankmask and photomaskS&S TECH CO LTD·Filed 2015·Granted Jul 10, 2018·0 cites·15 claims
- 2944US2020379337A1Blankmask and photomaskS&S TECH CO LTD·Filed 2020·Application pending·0 cites
- 3044US2022075258A1Blankmask and photomaskS&S TECH CO LTD·Filed 2019·Application pending·0 cites
- 3142US2021096458A1Pellicle for euv lithography and method for manufacturing the sameS&S TECH CO LTD·Filed 2019·Application pending·0 cites
- 3241US2022043336A1Pellicle for euv lithography, and method for manufacturing the sameS&S TECH CO LTD·Filed 2020·Application pending·0 cites
- 3340US2018335691A1Phase-shift blankmask and method of fabricating the sameS&S TECH CO LTD·Filed 2018·Application pending·0 cites
- 3439US2018335692A1Phase-shift blankmask and phase-shift photomaskS&S TECH CO LTD·Filed 2018·Application pending·0 cites
- 3537US2022066310A1Blankmask with backside conductive layer, and photomask manufactured with the sameS&S TECH CO LTD·Filed 2020·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →