Assignee
PECORA DAVID S
1 granted patent·1 pending application·1 citations·filing 2004–2006
Top patents by PatentIndex Score
2 records- 0136US2006231522A1Etch of silicon nitride selective to silicon and silicon dioxide useful during the formation of a semiconductor devicePECORA DAVID S·Filed 2006·Application pending·0 cites
- 0232US7060629B2Etch of silicon nitride selective to silicon and silicon dioxide useful during the formation of a semiconductor devicePECORA DAVID S·Filed 2004·Granted Jun 13, 2006·1 cites·10 claims
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