Assignee
PAUL HANS-JOCHEN
DE·0 granted patents·2 pending applications·0 citations·filing 2011–2012
Top patents by PatentIndex Score
2 records- 0141US2012134015A1Mirror for euv wavelengths, projection objective for microlithography having such mirror and projection exposure apparatus having such projection objectivePAUL HANS-JOCHEN·Filed 2011·Application pending·0 cites
- 0239US2012212810A1Mirror for the euv wavelength range, projection objective for microlithography cromprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objectivePAUL HANS-JOCHEN·Filed 2012·Application pending·0 cites
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