Assignee
PARK CHAN HA
KR·2 granted patents·3 citations·filing 2008–2009
Top patents by PatentIndex Score
2 records- 0166US8110507B2Method for patterning an active region in a semiconductor device using a space patterning processPARK CHAN HA·Filed 2008·Granted Feb 7, 2012·3 cites·9 claims
- 0249US8241836B2Method of fabricating a line pattern in a photoresist layer by using a photomask having slanted unit patternsPARK CHAN HA·Filed 2009·Granted Aug 14, 2012·0 cites·7 claims
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