Assignee
NANO MASTER INC
US·8 granted patents·2 pending applications·30 citations·filing 2017–2025
Top patents by PatentIndex Score
10 records- 0197US11087959B2Techniques for a hybrid design for efficient and economical plasma enhanced atomic layer deposition (PEALD) and plasma enhanced chemical vapor deposition (PECVD)NANO MASTER INC·Filed 2020·Granted Aug 10, 2021·8 cites·20 claims
- 0295US9972501B1Techniques and systems for continuous-flow plasma enhanced atomic layer deposition (PEALD)NANO MASTER INC·Filed 2017·Granted May 15, 2018·16 cites·15 claims
- 0385US10366898B2Techniques and systems for continuous-flow plasma enhanced atomic layer deposition (PEALD)NANO MASTER INC·Filed 2018·Granted Jul 30, 2019·3 cites·8 claims
- 0485US10361088B2Techniques and systems for continuous-flow plasma enhanced atomic layer deposition (PEALD)NANO MASTER INC·Filed 2018·Granted Jul 23, 2019·3 cites·7 claims
- 0576US2025068054A1Mask and Reticle Protection with Atomic Layer Deposition (ALD)NANO MASTER INC·Filed 2024·Application pending·0 cites
- 0672US2026038773A1Hybrid Plasma-Enhanced Atomic Layer Etching (PEALE) And Plasma-Enhanced Atomic Layer Deposition (PEALD) In A Single Reactor/ChamberNANO MASTER INC·Filed 2025·Application pending·0 cites
- 0770US12195850B2Apparatus and methods for roll-to-roll (R2R) plasma enhanced/activated atomic layer deposition (PEALD/PAALD)NANO MASTER INC·Filed 2022·Granted Jan 14, 2025·0 cites·10 claims
- 0868US12180586B2Apparatus and methods for roll-to-roll (R2R) plasma enhanced/activated atomic layer deposition (PEALD/PAALD)NANO MASTER INC·Filed 2021·Granted Dec 31, 2024·0 cites·8 claims
- 0961US12197125B2Mask and reticle protection with atomic layer deposition (ALD)NANO MASTER INC·Filed 2020·Granted Jan 14, 2025·0 cites·8 claims
- 1059US11640900B2Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma source (HCPS)NANO MASTER INC·Filed 2021·Granted May 2, 2023·0 cites·20 claims
Join the waitlist — get patent alerts
Get an alert when NANO MASTER INC files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →