Assignee
NAKATA YOSHIHIRO
JP·2 granted patents·0 citations·filing 2006–2009
Top patents by PatentIndex Score
2 records- 0159US8124239B2Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the sameNAKATA YOSHIHIRO·Filed 2009·Granted Feb 28, 2012·0 cites·3 claims
- 0246US8440577B2Method for reducing metal, multilayer interconnection structure and manufacturing method for the same, and semiconductor device and manufacturing method for the sameNAKATA YOSHIHIRO·Filed 2006·Granted May 14, 2013·0 cites·15 claims
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