Assignee
MUI DAVID
0 granted patents·2 pending applications·0 citations·filing 2007–2007
Technology mixH10P2
Top patents by PatentIndex Score
2 records- 0154US2007295455A1Method and apparatus for etching material layers with high uniformity of a lateral etch rate across a substrateMUI DAVID·Filed 2007·Application pending·0 cites
- 0254US2007202706A1Method and apparatus for etching material layers with high uniformity of a lateral etch rate across a substrateMUI DAVID·Filed 2007·Application pending·0 cites
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