Assignee
MATTSON TECH INC
US·210 granted patents·39 pending applications·7,021 citations·filing 1994–2024
Top patents by PatentIndex Score
249 records- 0199US11062912B2Atomic layer etch process using plasma in conjunction with a rapid thermal activation processMATTSON TECH INC·Filed 2020·Granted Jul 13, 2021·11 cites·20 claims
- 0298US12002652B2Variable mode plasma chamber utilizing tunable plasma potentialMATTSON TECH INC·Filed 2021·Granted Jun 4, 2024·4 cites·13 claims
- 0398US10037867B2Inductive plasma source with high coupling efficiencyMATTSON TECH INC·Filed 2014·Granted Jul 31, 2018·55 cites·11 claims
- 0498US7642205B2Rapid thermal processing using energy transfer layersMATTSON TECH INC·Filed 2005·Granted Jan 5, 2010·57 cites·8 claims
- 0598US6451713B1UV pretreatment process for ultra-thin oxynitride formationMATTSON TECH INC·Filed 2001·Granted Sep 17, 2002·510 cites·14 claims
- 0697US11495437B2Surface pretreatment process to improve quality of oxide films produced by remote plasmaMATTSON TECH INC·Filed 2020·Granted Nov 8, 2022·4 cites·20 claims
- 0797US11257680B2Methods for processing a workpiece using fluorine radicalsMATTSON TECH INC·Filed 2020·Granted Feb 22, 2022·4 cites·20 claims
- 0897US10269574B1Surface treatment of carbon containing films using organic radicalsMATTSON TECH INC·Filed 2018·Granted Apr 23, 2019·12 cites·25 claims
- 0997US7015422B2System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energyMATTSON TECH INC·Filed 2001·Granted Mar 21, 2006·98 cites·95 claims
- 1097US6315512B1Systems and methods for robotic transfer of workpieces between a storage area and a processing chamberMATTSON TECH INC·Filed 1998·Granted Nov 13, 2001·737 cites·32 claims
- 1197US6253704B1Apparatus and method for pulsed plasma processing of a semiconductor substrateMATTSON TECH INC·Filed 1999·Granted Jul 3, 2001·117 cites·26 claims
- 1297US6172337B1System and method for thermal processing of a semiconductor substrateMATTSON TECH INC·Filed 1999·Granted Jan 9, 2001·190 cites·23 claims
- 1397US6143129AInductive plasma reactorMATTSON TECH INC·Filed 1998·Granted Nov 7, 2000·374 cites·35 claims
- 1497US5811022AInductive plasma reactorMATTSON TECH INC·Filed 1994·Granted Sep 22, 1998·282 cites·57 claims
- 1597US5534231ALow frequency inductive RF plasma reactorMATTSON TECH INC·Filed 1995·Granted Jul 9, 1996·142 cites·114 claims
- 1696US12040159B2Dual frequency matching circuit for inductively coupled plasma (ICP) loadsMATTSON TECH INC·Filed 2022·Granted Jul 16, 2024·2 cites·19 claims
- 1796US11043393B2Ozone treatment for selective silicon nitride etch over siliconMATTSON TECH INC·Filed 2020·Granted Jun 22, 2021·5 cites·20 claims
- 1896US7317870B2Pulsed processing semiconductor heating methods using combinations of heating sourcesMATTSON TECH INC·Filed 2005·Granted Jan 8, 2008·46 cites·49 claims
- 1996US6849831B2Pulsed processing semiconductor heating methods using combinations of heating sourcesMATTSON TECH INC·Filed 2002·Granted Feb 1, 2005·135 cites·111 claims
- 2096US6805139B1Systems and methods for photoresist strip and residue treatment in integrated circuit manufacturingMATTSON TECH INC·Filed 2000·Granted Oct 19, 2004·138 cites·28 claims
- 2196US6551447B1Inductive plasma reactorMATTSON TECH INC·Filed 2000·Granted Apr 22, 2003·113 cites·31 claims
- 2296US5983828AApparatus and method for pulsed plasma processing of a semiconductor substrateMATTSON TECH INC·Filed 1996·Granted Nov 16, 1999·123 cites·46 claims
- 2395US12159770B2Cooled shield for ICP sourceMATTSON TECH INC·Filed 2021·Granted Dec 3, 2024·2 cites·16 claims
- 2495US11348767B2Plasma processing apparatus having a focus ring adjustment assemblyMATTSON TECH INC·Filed 2020·Granted May 31, 2022·4 cites·15 claims
- 2595US7453051B2System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energyMATTSON TECH INC·Filed 2006·Granted Nov 18, 2008·20 cites·38 claims
- 2695US7358462B2Apparatus and method for reducing stray light in substrate processing chambersMATTSON TECH INC·Filed 2006·Granted Apr 15, 2008·23 cites·54 claims
- 2795US7269343B2Heating configuration for use in thermal processing chambersMATTSON TECH INC·Filed 2005·Granted Sep 11, 2007·37 cites·20 claims
- 2895US6951996B2Pulsed processing semiconductor heating methods using combinations of heating sourcesMATTSON TECH INC·Filed 2003·Granted Oct 4, 2005·84 cites·79 claims
- 2995US6794301B2Pulsed plasma processing of semiconductor substratesMATTSON TECH INC·Filed 2002·Granted Sep 21, 2004·64 cites·39 claims
- 3095US6403925B1System and method for thermal processing of a semiconductor substrateMATTSON TECH INC·Filed 2000·Granted Jun 11, 2002·47 cites·20 claims
- 3195US6335293B1Systems and methods for two-sided etch of a semiconductor substrateMATTSON TECH INC·Filed 1999·Granted Jan 1, 2002·384 cites·20 claims
- 3295US5830277AThermal processing system with supplemental resistive heater and shielded optical pyrometryMATTSON TECH INC·Filed 1995·Granted Nov 3, 1998·172 cites·80 claims
- 3394US11276560B2Spacer etching processMATTSON TECH INC·Filed 2020·Granted Mar 15, 2022·4 cites·17 claims
- 3494US10804109B2Surface treatment of silicon and carbon containing films by remote plasma with organic precursorsMATTSON TECH INC·Filed 2018·Granted Oct 13, 2020·6 cites·27 claims
- 3594US7957926B2System and process for calibrating pyrometers in thermal processing chambersMATTSON TECH INC·Filed 2010·Granted Jun 7, 2011·11 cites·22 claims
- 3694US7543981B2Methods for determining wafer temperatureMATTSON TECH INC·Filed 2006·Granted Jun 9, 2009·29 cites·13 claims
- 3794US7226488B2Fast heating and cooling apparatus for semiconductor wafersMATTSON TECH INC·Filed 2005·Granted Jun 5, 2007·21 cites·22 claims
- 3894US6200634B1Thermal processing system with supplemental resistive heater and shielded optical pyrometryMATTSON TECH INC·Filed 1998·Granted Mar 13, 2001·143 cites·30 claims
- 3993US11062910B2Surface treatment of silicon or silicon germanium surfaces using organic radicalsMATTSON TECH INC·Filed 2019·Granted Jul 13, 2021·4 cites·18 claims
- 4093US10403492B1Integration of materials removal and surface treatment in semiconductor device fabricationMATTSON TECH INC·Filed 2018·Granted Sep 3, 2019·8 cites·19 claims
- 4193US8000587B2Pulsed processing semiconductor heating methods and associated system using combinations of heating sourcesMATTSON TECH INC·Filed 2007·Granted Aug 16, 2011·17 cites·21 claims
- 4293US7745762B2Optimizing the thermal budget during a pulsed heating processMATTSON TECH INC·Filed 2006·Granted Jun 29, 2010·19 cites·56 claims
- 4393US6835914B2Apparatus and method for reducing stray light in substrate processing chambersMATTSON TECH INC·Filed 2002·Granted Dec 28, 2004·52 cites·47 claims
- 4493US6727474B2Rapid thermal processing chamber for processing multiple wafersMATTSON TECH INC·Filed 2001·Granted Apr 27, 2004·58 cites·40 claims
- 4593US6717158B1Heating device for heating semiconductor wafers in thermal processing chambersMATTSON TECH INC·Filed 2000·Granted Apr 6, 2004·74 cites·15 claims
- 4693US6002109ASystem and method for thermal processing of a semiconductor substrateMATTSON TECH INC·Filed 1995·Granted Dec 14, 1999·80 cites·72 claims
- 4792US11482434B2Systems and methods for workpiece processingMATTSON TECH INC·Filed 2021·Granted Oct 25, 2022·2 cites·20 claims
- 4892US11189464B2Variable mode plasma chamber utilizing tunable plasma potentialMATTSON TECH INC·Filed 2019·Granted Nov 30, 2021·5 cites·20 claims
- 4992US10950416B2Chamber seasoning to improve etch uniformity by reducing chemistryMATTSON TECH INC·Filed 2019·Granted Mar 16, 2021·5 cites·18 claims
- 5092US10580661B2Atomic layer etch process using plasma in conjunction with a rapid thermal activation processMATTSON TECH INC·Filed 2017·Granted Mar 3, 2020·5 cites·18 claims
Showing the top 50 of 249 patent records by PatentIndex Score.
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