Assignee
LI SIYI
US·1 granted patent·4 pending applications·0 citations·filing 2007–2011
Top patents by PatentIndex Score
5 records- 0139US2009140418A1Method for integrating porous low-k dielectric layersLI SIYI·Filed 2007·Application pending·0 cites
- 0238US2010022091A1Method for plasma etching porous low-k dielectric layersLI SIYI·Filed 2008·Application pending·0 cites
- 0337US2009117745A1Methods for selectively etching a barrier layer in dual damascene applicationsLI SIYI·Filed 2007·Application pending·0 cites
- 0437US2010043821A1method of photoresist removal in the presence of a low-k dielectric layerLI SIYI·Filed 2008·Application pending·0 cites
- 0528US8906248B2Silicon on insulator etchLI SIYI·Filed 2011·Granted Dec 9, 2014·0 cites·16 claims
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