Assignee
KOTANI TOSHIYA
JP·8 granted patents·2 pending applications·22 citations·filing 2005–2011
Top patents by PatentIndex Score
10 records- 0186US8307310B2Pattern generating method, method of manufacturing semiconductor device, computer program product, and pattern-shape-determination-parameter generating methodKOTANI TOSHIYA·Filed 2010·Granted Nov 6, 2012·11 cites·21 claims
- 0285USRE43659EMethod for making a design layout of a semiconductor integrated circuitKOTANI TOSHIYA·Filed 2010·Granted Sep 11, 2012·6 cites·13 claims
- 0373US8108824B2Pattern verification method, method of manufacturing semiconductor device, and recording mediaKOTANI TOSHIYA·Filed 2009·Granted Jan 31, 2012·3 cites·20 claims
- 0469US8142961B2Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing methodKOTANI TOSHIYA·Filed 2010·Granted Mar 27, 2012·2 cites·16 claims
- 0562US8065637B2Semiconductor deviceKOTANI TOSHIYA·Filed 2008·Granted Nov 22, 2011·0 cites·25 claims
- 0656US8332784B2Semiconductor deviceKOTANI TOSHIYA·Filed 2011·Granted Dec 11, 2012·0 cites·17 claims
- 0747US2005251781A1Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting programKOTANI TOSHIYA·Filed 2005·Application pending·0 cites
- 0845US8101516B2Method of forming contact hole pattern in semiconductor integrated circuit deviceKOTANI TOSHIYA·Filed 2007·Granted Jan 24, 2012·0 cites·9 claims
- 0943US8440376B2Exposure determining method, method of manufacturing semiconductor device, and computer program productKOTANI TOSHIYA·Filed 2011·Granted May 14, 2013·0 cites·3 claims
- 1034US2011065030A1Mask pattern determining method, mask manufacturing method, and device manufacturing methodKOTANI TOSHIYA·Filed 2010·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →