Assignee
KOHNO MASAYUKI
JP·4 granted patents·1 citations·filing 2007–2012
Top patents by PatentIndex Score
4 records- 0161US8138103B2Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor deviceKOHNO MASAYUKI·Filed 2007·Granted Mar 20, 2012·1 cites·14 claims
- 0251US8329596B2Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor deviceKOHNO MASAYUKI·Filed 2012·Granted Dec 11, 2012·0 cites·13 claims
- 0345US8318614B2Method for forming silicon nitride film, method for manufacturing nonvolatile semiconductor memory device, nonvolatile semiconductor memory device and plasma apparatusKOHNO MASAYUKI·Filed 2008·Granted Nov 27, 2012·0 cites·14 claims
- 0443US8114790B2Plasma CVD method, silicon nitride film formation method, semiconductor device manufacturing method, and plasma CVD apparatusKOHNO MASAYUKI·Filed 2007·Granted Feb 14, 2012·0 cites·13 claims
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