Assignee
K C TECH CO LTD
KR·17 granted patents·5 pending applications·147 citations·filing 2001–2016
Top patents by PatentIndex Score
22 records- 0193US7442112B2Nozzle for spraying sublimable solid particles entrained in gas for cleaning surfaceK C TECH CO LTD·Filed 2005·Granted Oct 28, 2008·64 cites·13 claims
- 0290US7762869B2Nozzle for spraying sublimable solid particles entrained in gas for cleaning surfaceK C TECH CO LTD·Filed 2008·Granted Jul 27, 2010·23 cites·9 claims
- 0383US10518382B2Substrate processing systemK C TECH CO LTD·Filed 2016·Granted Dec 31, 2019·6 cites·35 claims
- 0482US7013660B2System for forming aerosols and cooling device incorporated thereinK C TECH CO LTD·Filed 2005·Granted Mar 21, 2006·7 cites·4 claims
- 0581US10002777B2Substrate processing system and substrate processing methodK C TECH CO LTD·Filed 2016·Granted Jun 19, 2018·7 cites·25 claims
- 0679US10077381B2Polishing slurry compositionK C TECH CO LTD·Filed 2016·Granted Sep 18, 2018·2 cites·13 claims
- 0777US7364600B2Slurry for CMP and method of polishing substrate using sameK C TECH CO LTD·Filed 2005·Granted Apr 29, 2008·6 cites·9 claims
- 0876US7470295B2Polishing slurry, method of producing same, and method of polishing substrateK C TECH CO LTD·Filed 2005·Granted Dec 30, 2008·6 cites·11 claims
- 0971US7892069B2Loading device of chemical mechanical polishing equipment for semiconductor wafersK C TECH CO LTD·Filed 2006·Granted Feb 22, 2011·5 cites·7 claims
- 1070US9704729B2Substrate cleaning apparatus and method and brush assembly used thereinK C TECH CO LTD·Filed 2014·Granted Jul 11, 2017·2 cites·20 claims
- 1166US7674156B2Cleaning device for chemical mechanical polishing equipmentK C TECH CO LTD·Filed 2007·Granted Mar 9, 2010·4 cites·15 claims
- 1261US8361177B2Polishing slurry, method of producing same, and method of polishing substrateK C TECH CO LTD·Filed 2008·Granted Jan 29, 2013·0 cites·5 claims
- 1360US7270136B2Apparatus for cleaning the edges of wafersK C TECH CO LTD·Filed 2001·Granted Sep 18, 2007·10 cites·9 claims
- 1453US6978625B1System for forming aerosols and cooling device incorporated thereinK C TECH CO LTD·Filed 2001·Granted Dec 27, 2005·3 cites·8 claims
- 1552US2007275157A1Apparatus and method for measuring widthwise ejection uniformity of slit nozzleK C TECH CO LTD·Filed 2007·Application pending·0 cites
- 1646US7008306B2Nozzle for injecting sublimable solid particles entrained in gas for cleaning a surfaceK C TECH CO LTD·Filed 2002·Granted Mar 7, 2006·2 cites·8 claims
- 1741US10138395B2Abrasive particle-dispersion layer composite and polishing slurry composition including the sameK C TECH CO LTD·Filed 2016·Granted Nov 27, 2018·0 cites·15 claims
- 1840US2007182327A1Manufacturing method of electrode for atmospheric pressure plasma, electrode structure, and atmospheric pressure plasma apparatus using the sameK C TECH CO LTD·Filed 2006·Application pending·0 cites
- 1939US2007272146A1Apparatus and method for measuring widthwise ejection uniformity of slit nozzleK C TECH CO LTD·Filed 2007·Application pending·0 cites
- 2032US2017183537A1Polishing slurry compositionK C TECH CO LTD·Filed 2015·Application pending·0 cites
- 2132US2016108518A1Thin film manufacturing method and atomic layer deposition apparatusK C TECH CO LTD·Filed 2015·Application pending·0 cites
- 2229US9994735B2Slurry composition for polishing tungstenK C TECH CO LTD·Filed 2016·Granted Jun 12, 2018·0 cites·18 claims
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