Assignee
ITOH MASAMITSU
JP·14 granted patents·2 pending applications·33 citations·filing 2006–2012
Top patents by PatentIndex Score
16 records- 0184US8533634B2Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks productITOH MASAMITSU·Filed 2010·Granted Sep 10, 2013·3 cites·13 claims
- 0284US8502171B2Mask manufacturing deviceITOH MASAMITSU·Filed 2011·Granted Aug 6, 2013·4 cites·5 claims
- 0384US8407628B2Photomask manufacturing method and semiconductor device manufacturing methodITOH MASAMITSU·Filed 2010·Granted Mar 26, 2013·3 cites·10 claims
- 0483US8216744B2Exposure mask and method for manufacturing same and method for manufacturing semiconductor deviceITOH MASAMITSU·Filed 2010·Granted Jul 10, 2012·4 cites·16 claims
- 0582US8097539B2Imprint mask manufacturing method for nanoimprintingITOH MASAMITSU·Filed 2009·Granted Jan 17, 2012·5 cites·15 claims
- 0679US8407629B2Pattern verification-test method, optical image intensity distribution acquisition method, and computer programITOH MASAMITSU·Filed 2012·Granted Mar 26, 2013·2 cites·6 claims
- 0778US8193100B2Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks productITOH MASAMITSU·Filed 2009·Granted Jun 5, 2012·3 cites·13 claims
- 0878US8189903B2Photomask evaluation based on lithographic simulation using sidewall angle of photomask patternITOH MASAMITSU·Filed 2006·Granted May 29, 2012·4 cites·6 claims
- 0972US8219942B2Pattern verification-test method, optical image intensity distribution acquisition method, and computer programITOH MASAMITSU·Filed 2009·Granted Jul 10, 2012·2 cites·9 claims
- 1066US9034467B2Reticle chuck cleanerITOH MASAMITSU·Filed 2011·Granted May 19, 2015·2 cites·5 claims
- 1166US8758005B2Imprint mask, method for manufacturing the same, and method for manufacturing semiconductor deviceITOH MASAMITSU·Filed 2011·Granted Jun 24, 2014·1 cites·7 claims
- 1263US8465907B2Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and serverITOH MASAMITSU·Filed 2012·Granted Jun 18, 2013·0 cites·6 claims
- 1360US8222051B2Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and serverITOH MASAMITSU·Filed 2011·Granted Jul 17, 2012·0 cites·5 claims
- 1455US8771905B2Exposure mask and method for manufacturing same and method for manufacturing semiconductor deviceITOH MASAMITSU·Filed 2012·Granted Jul 8, 2014·0 cites·3 claims
- 1544US2007064997A1Mask defect inspecting method, mask defect inspecting apparatus, and semiconductor device manufacturing methodITOH MASAMITSU·Filed 2006·Application pending·0 cites
- 1637US2010276290A1Patterning method, patterning apparatus, and method for manufacturing semiconductor deviceITOH MASAMITSU·Filed 2010·Application pending·0 cites
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