Assignee
IONQUEST CORP
US·10 granted patents·3 pending applications·27 citations·filing 2017–2022
Top patents by PatentIndex Score
13 records- 0198US11306391B2Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIONQUEST CORP·Filed 2020·Granted Apr 19, 2022·3 cites·20 claims
- 0297US10913998B2Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIONQUEST CORP·Filed 2019·Granted Feb 9, 2021·11 cites·15 claims
- 0396US11823859B2Sputtering a layer on a substrate using a high-energy density plasma magnetronIONQUEST CORP·Filed 2020·Granted Nov 21, 2023·4 cites·19 claims
- 0491US11359274B2Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering sourceIONQUEST CORP·Filed 2019·Granted Jun 14, 2022·6 cites·24 claims
- 0591US10900118B2Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like filmsIONQUEST CORP·Filed 2019·Granted Jan 26, 2021·3 cites·19 claims
- 0681US11821068B2Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIONQUEST CORP·Filed 2022·Granted Nov 21, 2023·0 cites·20 claims
- 0776US11286555B2Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIONQUEST CORP·Filed 2020·Granted Mar 29, 2022·0 cites·17 claims
- 0869US11255012B2Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering sourceIONQUEST CORP·Filed 2019·Granted Feb 22, 2022·0 cites·13 claims
- 0968US12077849B2Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering sourceIONQUEST CORP·Filed 2022·Granted Sep 3, 2024·0 cites·20 claims
- 1068US2021317569A1Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like FilmsIONQUEST CORP·Filed 2021·Application pending·0 cites
- 1162US2023005724A1Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering SourceIONQUEST CORP·Filed 2022·Application pending·0 cites
- 1259US12217949B2Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIONQUEST CORP·Filed 2021·Granted Feb 4, 2025·0 cites·31 claims
- 1339US2020176234A1High-power resonance pulse ac hedp sputtering source and method for material processingIONQUEST CORP·Filed 2017·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →