Assignee
IBIS TECHNOLOGY CORP
US·20 granted patents·4 pending applications·804 citations·filing 1989–2007
Top patents by PatentIndex Score
24 records- 0195US6248642B1SIMOX using controlled water vapor for oxygen implantsIBIS TECHNOLOGY CORP·Filed 1999·Granted Jun 19, 2001·96 cites·13 claims
- 0292US6593173B1Low defect density, thin-layer, SOI substratesIBIS TECHNOLOGY CORP·Filed 2000·Granted Jul 15, 2003·83 cites·39 claims
- 0392US5481116AMagnetic system and method for uniformly scanning heavy ion beamsIBIS TECHNOLOGY CORP·Filed 1994·Granted Jan 2, 1996·89 cites·37 claims
- 0491US6417078B1Implantation process using sub-stoichiometric, oxygen doses at different energiesIBIS TECHNOLOGY CORP·Filed 2000·Granted Jul 9, 2002·101 cites·20 claims
- 0586US5196355ASimox materials through energy variationIBIS TECHNOLOGY CORP·Filed 1990·Granted Mar 23, 1993·115 cites·8 claims
- 0685US5288650APrenucleation process for simox device fabricationIBIS TECHNOLOGY CORP·Filed 1992·Granted Feb 22, 1994·119 cites·14 claims
- 0781US5053627AApparatus for ion implantationIBIS TECHNOLOGY CORP·Filed 1990·Granted Oct 1, 1991·42 cites·6 claims
- 0871US6794264B2Implantation process using substoichiometric, oxygen doses at different energiesIBIS TECHNOLOGY CORP·Filed 2002·Granted Sep 21, 2004·18 cites·8 claims
- 0967US6794662B1Thermosetting resin wafer-holding pinIBIS TECHNOLOGY CORP·Filed 2003·Granted Sep 21, 2004·12 cites·26 claims
- 1066US5080730AImplantation profile control with surface sputteringIBIS TECHNOLOGY CORP·Filed 1989·Granted Jan 14, 1992·33 cites·8 claims
- 1165US6998353B2Active wafer cooling during damage engineering implant to enhance buried oxide formation in SIMOX wafersIBIS TECHNOLOGY CORP·Filed 2001·Granted Feb 14, 2006·13 cites·17 claims
- 1263US6863736B2Shaft cooling mechanismsIBIS TECHNOLOGY CORP·Filed 2002·Granted Mar 8, 2005·10 cites·25 claims
- 1361US6815696B2Beam stop for use in an ion implantation systemIBIS TECHNOLOGY CORP·Filed 2002·Granted Nov 9, 2004·5 cites·20 claims
- 1459US7294561B2Internal gettering in SIMOX SOI silicon substratesIBIS TECHNOLOGY CORP·Filed 2003·Granted Nov 13, 2007·8 cites·27 claims
- 1558US6661017B1Ion implantation system having an energy probeIBIS TECHNOLOGY CORP·Filed 2002·Granted Dec 9, 2003·4 cites·11 claims
- 1655US6744017B2Wafer heating devices for use in ion implantation systemsIBIS TECHNOLOGY CORP·Filed 2002·Granted Jun 1, 2004·5 cites·18 claims
- 1755US6452195B1Wafer holding pinIBIS TECHNOLOGY CORP·Filed 1999·Granted Sep 17, 2002·19 cites·36 claims
- 1852US6433342B1Coated wafer holding pinIBIS TECHNOLOGY CORP·Filed 1999·Granted Aug 13, 2002·16 cites·16 claims
- 1951US6774376B2Wafer holding pinIBIS TECHNOLOGY CORP·Filed 2002·Granted Aug 10, 2004·3 cites·29 claims
- 2048US6155436AArc inhibiting wafer holder assemblyIBIS TECHNOLOGY CORP·Filed 1999·Granted Dec 5, 2000·13 cites·13 claims
- 2148US2007194227A1Method of characterizing an ion beamIBIS TECHNOLOGY CORP·Filed 2007·Application pending·0 cites
- 2247US2008073553A1Ion beam profilerIBIS TECHNOLOGY CORP·Filed 2007·Application pending·0 cites
- 2344US2007187618A1Electrostatic particle gettering in an ion implanterIBIS TECHNOLOGY CORP·Filed 2007·Application pending·0 cites
- 2440US2007199656A1Hybrid wafer-holderIBIS TECHNOLOGY CORP·Filed 2007·Application pending·0 cites
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