Assignee
HOTZEL ARTHUR
DE·7 granted patents·13 citations·filing 2010–2013
Top patents by PatentIndex Score
7 records- 0185US8551677B2Lithographic CD correction by second exposureHOTZEL ARTHUR·Filed 2011·Granted Oct 8, 2013·5 cites·24 claims
- 0274US9075934B2Reticle defect correction by second exposureHOTZEL ARTHUR·Filed 2013·Granted Jul 7, 2015·2 cites·16 claims
- 0373US8574795B2Lithographic CD correction by second exposureHOTZEL ARTHUR·Filed 2012·Granted Nov 5, 2013·2 cites·22 claims
- 0467US8785112B2Reticle defect correction by second exposureHOTZEL ARTHUR·Filed 2011·Granted Jul 22, 2014·1 cites·13 claims
- 0566US8518189B2Vapor clean for haze and particle removal from lithographic photomasksHOTZEL ARTHUR·Filed 2010·Granted Aug 27, 2013·1 cites·11 claims
- 0665US8681310B2Mechanical fixture of pellicle to lithographic photomaskHOTZEL ARTHUR·Filed 2010·Granted Mar 25, 2014·1 cites·18 claims
- 0762US9091943B2Asymmetric reticle heating of multilayer reticles eliminated by dummy exposures and related methodsHOTZEL ARTHUR·Filed 2012·Granted Jul 28, 2015·1 cites·21 claims
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