Assignee
GENUS INC
US·66 granted patents·9,437 citations·filing 1983–2005
Top patents by PatentIndex Score
66 records- 0199US6540838B2Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer depositionGENUS INC·Filed 2002·Granted Apr 1, 2003·447 cites·10 claims
- 0299US6503330B1Apparatus and method to achieve continuous interface and ultrathin film during atomic layer depositionGENUS INC·Filed 1999·Granted Jan 7, 2003·616 cites·15 claims
- 0399US6475910B1Radical-assisted sequential CVDGENUS INC·Filed 2000·Granted Nov 5, 2002·263 cites·23 claims
- 0499US6451695B2Radical-assisted sequential CVDGENUS INC·Filed 2000·Granted Sep 17, 2002·372 cites·11 claims
- 0599US6305314B1Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer depositionGENUS INC·Filed 1999·Granted Oct 23, 2001·487 cites·20 claims
- 0699US6200893B1Radical-assisted sequential CVDGENUS INC·Filed 1999·Granted Mar 13, 2001·1k cites·35 claims
- 0798US6451119B2Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer depositionGENUS INC·Filed 2000·Granted Sep 17, 2002·341 cites·8 claims
- 0898US6174377B1Processing chamber for atomic layer deposition processesGENUS INC·Filed 1999·Granted Jan 16, 2001·639 cites·9 claims
- 0998US5879459AVertically-stacked process reactor and cluster tool system for atomic layer depositionGENUS INC·Filed 1997·Granted Mar 9, 1999·1.2k cites·25 claims
- 1097US6638859B2Apparatus and method to achieve continuous interface and ultrathin film during atomic layer depositionGENUS INC·Filed 2002·Granted Oct 28, 2003·154 cites·31 claims
- 1197US6602784B2Radical-assisted sequential CVDGENUS INC·Filed 2002·Granted Aug 5, 2003·96 cites·3 claims
- 1297US6551399B1Fully integrated process for MIM capacitors using atomic layer depositionGENUS INC·Filed 2000·Granted Apr 22, 2003·169 cites·12 claims
- 1397US6206972B1Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processesGENUS INC·Filed 1999·Granted Mar 27, 2001·301 cites·14 claims
- 1496US6387185B2Processing chamber for atomic layer deposition processesGENUS INC·Filed 2001·Granted May 14, 2002·123 cites·10 claims
- 1595US6638862B2Radical-assisted sequential CVDGENUS INC·Filed 2002·Granted Oct 28, 2003·58 cites·3 claims
- 1695US6616766B2Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processesGENUS INC·Filed 2002·Granted Sep 9, 2003·62 cites·26 claims
- 1795US5855675AMultipurpose processing chamber for chemical vapor deposition processesGENUS INC·Filed 1997·Granted Jan 5, 1999·230 cites·19 claims
- 1895US5222567APower assist device for a wheelchairGENUS INC·Filed 1991·Granted Jun 29, 1993·226 cites·24 claims
- 1995US4565157AMethod and apparatus for deposition of tungsten silicidesGENUS INC·Filed 1983·Granted Jan 21, 1986·110 cites·25 claims
- 2095US4550684ACooled optical window for semiconductor wafer heatingGENUS INC·Filed 1983·Granted Nov 5, 1985·77 cites·11 claims
- 2194US6818067B2Processing chamber for atomic layer deposition processesGENUS INC·Filed 2002·Granted Nov 16, 2004·75 cites·1 claims
- 2294US6630401B2Radical-assisted sequential CVDGENUS INC·Filed 2002·Granted Oct 7, 2003·52 cites·5 claims
- 2394US6617173B1Integration of ferromagnetic films with ultrathin insulating film using atomic layer depositionGENUS INC·Filed 2001·Granted Sep 9, 2003·78 cites·21 claims
- 2494US5215639AComposite sputtering target structures and process for producing such structuresGENUS INC·Filed 1991·Granted Jun 1, 1993·94 cites·3 claims
- 2593US6905547B1Method and apparatus for flexible atomic layer depositionGENUS INC·Filed 2002·Granted Jun 14, 2005·78 cites·74 claims
- 2693US6626998B1Plasma generator assembly for use in CVD and PECVD processesGENUS INC·Filed 2000·Granted Sep 30, 2003·49 cites·4 claims
- 2792US7018940B2Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processesGENUS INC·Filed 2003·Granted Mar 28, 2006·61 cites·10 claims
- 2892US4629635AProcess for depositing a low resistivity tungsten silicon composite film on a substrateGENUS INC·Filed 1984·Granted Dec 16, 1986·90 cites·6 claims
- 2991US6897119B1Apparatus and method to achieve continuous interface and ultrathin film during atomic layer depositionGENUS INC·Filed 2003·Granted May 24, 2005·46 cites·3 claims
- 3091US6720259B2Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor depositionGENUS INC·Filed 2002·Granted Apr 13, 2004·56 cites·30 claims
- 3191US5383971ADifferential pressure CVD chuckGENUS INC·Filed 1992·Granted Jan 24, 1995·98 cites·12 claims
- 3291US4690746AInterlayer dielectric processGENUS INC·Filed 1986·Granted Sep 1, 1987·312 cites·6 claims
- 3390US6284673B2Method for providing uniform gas delivery to substrates in CVD and PECVD processesGENUS INC·Filed 2001·Granted Sep 4, 2001·32 cites·4 claims
- 3490US5319212AMethod of monitoring ion beam current in ion implantation apparatus for use in manufacturing semiconductorsGENUS INC·Filed 1992·Granted Jun 7, 1994·82 cites·4 claims
- 3589US6902624B2Massively parallel atomic layer deposition/chemical vapor deposition systemGENUS INC·Filed 2002·Granted Jun 7, 2005·67 cites·18 claims
- 3689US5501993AMethod of constructing CMOS vertically modulated wells (VMW) by clustered MeV BILLI (buried implanted layer for lateral isolation) implantationGENUS INC·Filed 1994·Granted Mar 26, 1996·102 cites·21 claims
- 3789US5094885ADifferential pressure cvd chuckGENUS INC·Filed 1990·Granted Mar 10, 1992·81 cites·15 claims
- 3888US4973841APrecision ultra-sensitive trace detector for carbon-14 when it is at concentration close to that present in recent organic materialsGENUS INC·Filed 1990·Granted Nov 27, 1990·72 cites·1 claims
- 3987US5858471ASelective plasma depositionGENUS INC·Filed 1996·Granted Jan 12, 1999·81 cites·32 claims
- 4087US5294568AMethod of selective etching native oxideGENUS INC·Filed 1992·Granted Mar 15, 1994·111 cites·17 claims
- 4186US7129580B1Methods and procedures for engineering of composite conductive films by atomic layer depositionGENUS INC·Filed 2005·Granted Oct 31, 2006·13 cites·15 claims
- 4286US6863021B2Method and apparatus for providing and integrating a general metal delivery source (GMDS) with atomic layer deposition (ALD)GENUS INC·Filed 2002·Granted Mar 8, 2005·29 cites·15 claims
- 4384US7164203B1Methods and procedures for engineering of composite conductive by atomic layer depositionGENUS INC·Filed 2005·Granted Jan 16, 2007·8 cites·14 claims
- 4483US4932358APerimeter wafer sealGENUS INC·Filed 1989·Granted Jun 12, 1990·54 cites·13 claims
- 4583US4851295ALow resistivity tungsten silicon composite filmGENUS INC·Filed 1986·Granted Jul 25, 1989·59 cites·4 claims
- 4682US5447570APurge gas in wafer coating area selectionGENUS INC·Filed 1992·Granted Sep 5, 1995·88 cites·33 claims
- 4782US4680447ACooled optical window for semiconductor wafer heatingGENUS INC·Filed 1985·Granted Jul 14, 1987·43 cites·11 claims
- 4880US4795299ADial deposition and processing apparatusGENUS INC·Filed 1987·Granted Jan 3, 1989·63 cites·33 claims
- 4979US5762755AOrganic preclean for improving vapor phase wafer etch uniformityGENUS INC·Filed 1992·Granted Jun 9, 1998·72 cites·7 claims
- 5075US5814866ASemiconductor device having at least one field oxide area and CMOS vertically modulated wells (VMW) with a buried implanted layer for lateral isolation having a first portion below a well, a second portion forming another, adjacent well, and a vertical poGENUS INC·Filed 1996·Granted Sep 29, 1998·45 cites·15 claims
Showing the top 50 of 66 patent records by PatentIndex Score.
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