Assignee
FUJIMURA AKIRA
US·19 granted patents·7 pending applications·161 citations·filing 2007–2012
Top patents by PatentIndex Score
26 records- 0198US8304148B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Nov 6, 2012·15 cites·25 claims
- 0297US8501374B2Method for fracturing and forming a pattern using shaped beam charged particle beam lithographyFUJIMURA AKIRA·Filed 2012·Granted Aug 6, 2013·24 cites·35 claims
- 0397US8202672B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 19, 2012·15 cites·25 claims
- 0496US8473875B2Method and system for forming high accuracy patterns using charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 25, 2013·39 cites·16 claims
- 0594US8202673B2Method for manufacturing a surface and integrated circuit using variable shaped beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 19, 2012·15 cites·24 claims
- 0693US9057956B2Method and system for design of enhanced edge slope patterns for charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 16, 2015·9 cites·24 claims
- 0791US8302061B2Aware manufacturing of an integrated circuitFUJIMURA AKIRA·Filed 2011·Granted Oct 30, 2012·5 cites·19 claims
- 0890US8329365B2Method for design and manufacture of diagonal patterns with variable shaped beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Dec 11, 2012·8 cites·25 claims
- 0989US8057970B2Method and system for forming circular patterns on a surfaceFUJIMURA AKIRA·Filed 2009·Granted Nov 15, 2011·10 cites·20 claims
- 1087US8283094B2Method for fracturing and forming a pattern using circular characters with charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Oct 9, 2012·3 cites·25 claims
- 1182US8609306B2Method for forming circular patterns on a surfaceFUJIMURA AKIRA·Filed 2012·Granted Dec 17, 2013·2 cites·35 claims
- 1277US8637211B2Method for integrated circuit manufacturing and mask data preparation using curvilinear patternsFUJIMURA AKIRA·Filed 2011·Granted Jan 28, 2014·3 cites·25 claims
- 1374US8263295B2Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Sep 11, 2012·2 cites·18 claims
- 1471US8745549B2Method and system for forming high precision patterns using charged particle beam lithographyFUJIMURA AKIRA·Filed 2012·Granted Jun 3, 2014·2 cites·27 claims
- 1568US8221004B2Method of making wheel support bearingFUJIMURA AKIRA·Filed 2008·Granted Jul 17, 2012·4 cites·2 claims
- 1664US8703389B2Method and system for forming patterns with charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Apr 22, 2014·1 cites·28 claims
- 1763US8745555B2Method for integrated circuit design and manufacture using diagonal minimum-width patternsFUJIMURA AKIRA·Filed 2010·Granted Jun 3, 2014·2 cites·19 claims
- 1863US8142081B2Wheel support bearing assemblyFUJIMURA AKIRA·Filed 2007·Granted Mar 27, 2012·2 cites·8 claims
- 1957US2012219886A1Method and system for forming patterns using charged particle beam lithography with variable pattern dosageFUJIMURA AKIRA·Filed 2011·Application pending·0 cites
- 2054US8404404B2Method and system for manufacturing a surface using character projection lithography with variable magnificationFUJIMURA AKIRA·Filed 2010·Granted Mar 26, 2013·0 cites·12 claims
- 2152US2012278770A1Method and system for forming non-manhattan patterns using variable shaped beam lithographyFUJIMURA AKIRA·Filed 2012·Application pending·0 cites
- 2242US2012217421A1Method and system for forming patterns using charged particle beam lithography with overlapping shotsFUJIMURA AKIRA·Filed 2011·Application pending·0 cites
- 2341US2012128228A1Method for Matching of PatternsFUJIMURA AKIRA·Filed 2011·Application pending·0 cites
- 2441US2012221985A1Method and system for design of a surface to be manufactured using charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Application pending·0 cites
- 2541US2013070222A1Method and System for Optimization of an Image on a Substrate to be Manufactured Using Optical LithographyFUJIMURA AKIRA·Filed 2011·Application pending·0 cites
- 2638US2012221980A1Method and system for design of enhanced accuracy patterns for charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when FUJIMURA AKIRA files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →