Assignee
FORSTER JOHN C
US·4 granted patents·2 pending applications·14 citations·filing 2008–2014
Top patents by PatentIndex Score
6 records- 0185US8920611B2Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuningFORSTER JOHN C·Filed 2008·Granted Dec 30, 2014·10 cites·15 claims
- 0274US9017533B2Apparatus for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuningFORSTER JOHN C·Filed 2008·Granted Apr 28, 2015·3 cites·20 claims
- 0365US9355819B2Elongated capacitively coupled plasma source for high temperature low pressure environmentsFORSTER JOHN C·Filed 2014·Granted May 31, 2016·1 cites·20 claims
- 0456US2016024653A1Plasma Source For Rotating Platen ALD ChambersFORSTER JOHN C·Filed 2014·Application pending·0 cites
- 0550US8992747B2Apparatus and method for improved darkspace gap design in RF sputtering chamberFORSTER JOHN C·Filed 2010·Granted Mar 31, 2015·0 cites·7 claims
- 0636US2011315319A1Pre-clean chamber with reduced ion currentFORSTER JOHN C·Filed 2011·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →