Assignee
FOCUS EBEAM TECH BEIJING CO LTD
CN·12 granted patents·21 citations·filing 2017–2022
Top patents by PatentIndex Score
12 records- 0195US10777382B2Low voltage scanning electron microscope and method for specimen observationFOCUS EBEAM TECH BEIJING CO LTD·Filed 2018·Granted Sep 15, 2020·14 cites·21 claims
- 0288US11145487B2Scanning electron microscope with composite detection system and specimen detection methodFOCUS EBEAM TECH BEIJING CO LTD·Filed 2019·Granted Oct 12, 2021·3 cites·16 claims
- 0386US11075056B2Scanning electron microscope objective lens system and method for specimen observationFOCUS EBEAM TECH BEIJING CO LTD·Filed 2018·Granted Jul 27, 2021·3 cites·16 claims
- 0483US11798781B2MicroscopeFOCUS EBEAM TECH BEIJING CO LTD·Filed 2020·Granted Oct 24, 2023·1 cites·7 claims
- 0565US12224153B2Electron microscopeFOCUS EBEAM TECH BEIJING CO LTD·Filed 2021·Granted Feb 11, 2025·0 cites·10 claims
- 0658US12315694B2Electron beam systemFOCUS EBEAM TECH BEIJING CO LTD·Filed 2022·Granted May 27, 2025·0 cites·7 claims
- 0758US11508548B2Scanning electron microscopeFOCUS EBEAM TECH BEIJING CO LTD·Filed 2020·Granted Nov 22, 2022·0 cites·9 claims
- 0851US11598732B2Imaging system and method for specimen detectionFOCUS EBEAM TECH BEIJING CO LTD·Filed 2018·Granted Mar 7, 2023·0 cites·12 claims
- 0949US10879036B2Charged particle beam system, opto-electro simultaneous detection system and methodFOCUS EBEAM TECH BEIJING CO LTD·Filed 2017·Granted Dec 29, 2020·0 cites·18 claims
- 1045US10699874B2Vacuum condition controlling apparatus, system and method for specimen observationFOCUS EBEAM TECH BEIJING CO LTD·Filed 2017·Granted Jun 30, 2020·0 cites·19 claims
- 1144US10903039B2Vacuum condition processing apparatus, system and method for specimen observationFOCUS EBEAM TECH BEIJING CO LTD·Filed 2017·Granted Jan 26, 2021·0 cites·18 claims
- 1241US10923312B2Magnetic lens and exciting current control methodFOCUS EBEAM TECH BEIJING CO LTD·Filed 2017·Granted Feb 16, 2021·0 cites·6 claims
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →